NHx radical densities and plasma chemistry in a remote Ar-NK3-SiH4 plasma for silicon nitride deposition

P.J. Oever, van den, J.H. Helden, van, R.A.H. Engeln, D.C. Schram, M.C.M. Sanden, van de, W.M.M. Kessels

Research output: Chapter in Book/Report/Conference proceedingConference contributionAcademic

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Original languageEnglish
Title of host publicationProceedings of the 51st International Symposium of the American Vacuum Society (AVC), 14-19 November 2004, Anaheim, U.S.A.
Publication statusPublished - 2004

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