New transition probability values for argon used for mapping open and closed inductively coupled plasmas

J.J.A.M. Mullen, van der; R.D. Tas; J.M. Regt, de; J. Jonkers

New transition probability values for argon used for mapping open and closed inductively coupled plasmas

J.J.A.M. Mullen, van der, R.D. Tas, J.M. Regt, de, J. Jonkers

Plasma & Materials Processing

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution › Academic › peer-review

Original language	English
Title of host publication	Progress in Plasma Processing of Materials 1997, Proceedings of the 4th International Thermal Plasma Processes Conference, 4th, Athens, July 15-18, 1996
Editors	P. Fauchais
Place of Publication	New York
Publisher	Begell House Inc.
Pages	229-237
ISBN (Print)	1-56700-093-2
Publication status	Published - 1997
Event	conference; Progress in Plasma Processing of Materials 1997 : the 4th International Thermal Plasma Processes Conference, 4th, Athens, July 15-18, 1996 - Duration: 1 Jan 1997 → …

Conference

Conference	conference; Progress in Plasma Processing of Materials 1997 : the 4th International Thermal Plasma Processes Conference, 4th, Athens, July 15-18, 1996
Period	1/01/97 → …
Other	Progress in Plasma Processing of Materials 1997 : the 4th International Thermal Plasma Processes Conference, 4th, Athens, July 15-18, 1996

Cite this

Mullen, van der, J. J. A. M., Tas, R. D., Regt, de, J. M., & Jonkers, J. (1997). New transition probability values for argon used for mapping open and closed inductively coupled plasmas. In P. Fauchais (Ed.), Progress in Plasma Processing of Materials 1997, Proceedings of the 4th International Thermal Plasma Processes Conference, 4th, Athens, July 15-18, 1996 (pp. 229-237). Begell House Inc..

Mullen, van der, J.J.A.M. ; Tas, R.D. ; Regt, de, J.M. et al. / New transition probability values for argon used for mapping open and closed inductively coupled plasmas. Progress in Plasma Processing of Materials 1997, Proceedings of the 4th International Thermal Plasma Processes Conference, 4th, Athens, July 15-18, 1996. editor / P. Fauchais. New York : Begell House Inc., 1997. pp. 229-237

@inproceedings{cfac14d9b33f44818bf38f53f77f2994,

title = "New transition probability values for argon used for mapping open and closed inductively coupled plasmas",

author = "{Mullen, van der}, J.J.A.M. and R.D. Tas and {Regt, de}, J.M. and J. Jonkers",

year = "1997",

language = "English",

isbn = "1-56700-093-2",

pages = "229--237",

editor = "P. Fauchais",

booktitle = "Progress in Plasma Processing of Materials 1997, Proceedings of the 4th International Thermal Plasma Processes Conference, 4th, Athens, July 15-18, 1996",

publisher = "Begell House Inc.",

address = "United States",

note = "conference; Progress in Plasma Processing of Materials 1997 : the 4th International Thermal Plasma Processes Conference, 4th, Athens, July 15-18, 1996 ; Conference date: 01-01-1997",

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Mullen, van der, JJAM, Tas, RD, Regt, de, JM & Jonkers, J 1997, New transition probability values for argon used for mapping open and closed inductively coupled plasmas. in P Fauchais (ed.), Progress in Plasma Processing of Materials 1997, Proceedings of the 4th International Thermal Plasma Processes Conference, 4th, Athens, July 15-18, 1996. Begell House Inc., New York, pp. 229-237, conference; Progress in Plasma Processing of Materials 1997 : the 4th International Thermal Plasma Processes Conference, 4th, Athens, July 15-18, 1996, 1/01/97.

New transition probability values for argon used for mapping open and closed inductively coupled plasmas. / Mullen, van der, J.J.A.M.; Tas, R.D.; Regt, de, J.M. et al.
Progress in Plasma Processing of Materials 1997, Proceedings of the 4th International Thermal Plasma Processes Conference, 4th, Athens, July 15-18, 1996. ed. / P. Fauchais. New York: Begell House Inc., 1997. p. 229-237.

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution › Academic › peer-review

TY - GEN

T1 - New transition probability values for argon used for mapping open and closed inductively coupled plasmas

AU - Mullen, van der, J.J.A.M.

AU - Tas, R.D.

AU - Regt, de, J.M.

AU - Jonkers, J.

PY - 1997

Y1 - 1997

M3 - Conference contribution

SN - 1-56700-093-2

SP - 229

EP - 237

BT - Progress in Plasma Processing of Materials 1997, Proceedings of the 4th International Thermal Plasma Processes Conference, 4th, Athens, July 15-18, 1996

A2 - Fauchais, P.

PB - Begell House Inc.

CY - New York

T2 - conference; Progress in Plasma Processing of Materials 1997 : the 4th International Thermal Plasma Processes Conference, 4th, Athens, July 15-18, 1996

Y2 - 1 January 1997

ER -

Mullen, van der JJAM, Tas RD, Regt, de JM, Jonkers J. New transition probability values for argon used for mapping open and closed inductively coupled plasmas. In Fauchais P, editor, Progress in Plasma Processing of Materials 1997, Proceedings of the 4th International Thermal Plasma Processes Conference, 4th, Athens, July 15-18, 1996. New York: Begell House Inc. 1997. p. 229-237