The Eindhoven University of Technology, for one, is working on another approach—direct-write ALD. This is based on an area-selective ALD by an area-activation technique. This makes use of electron-beam induced deposition (EBID) or ion-beam induced deposition (IBID). "We combine the advantages of electron-beam patterning with the advantages of ALD," said Erwin Kessels, a professor at the Eindhoven University of Technology. "The patterning by the e-beam can take place in a SEM system, but it can also be done in a multi-electron beam system."
|Place of Publication||S.l.|
|Publication status||Published - 2015|