New design concepts for the fabrication of nanometric gap structures: electrochemical oxidation of OTS mono- and bilayer structures

T. Druzhinina; S. Höppener; U.S. Schubert

doi:10.1002/smll.201101842

New design concepts for the fabrication of nanometric gap structures: electrochemical oxidation of OTS mono- and bilayer structures

T. Druzhinina, S. Höppener, U.S. Schubert

Research output: Contribution to journal › Article › Academic › peer-review

5 Citations (Scopus)

Abstract

A reliable nanofabrication concept to engineer metallic nanometric gap structures and to incorporate silver nanoparticles within the gaps utilizing a combination of self-assembly strategies and electrochemical oxidation lithography is developed. The approach uses the differences in oxidation kinetics of n-octadecyltrichlorosilane (OTS) monolayer and bilayer structures. The processes are investigated in detail and form the basis for a new nanofabrication process.

Original language	English
Pages (from-to)	852-857
Journal	Small : Nano Micro
Volume	8
Issue number	6
DOIs	https://doi.org/10.1002/smll.201101842
Publication status	Published - 2012

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10.1002/smll.201101842

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title = "New design concepts for the fabrication of nanometric gap structures: electrochemical oxidation of OTS mono- and bilayer structures",

abstract = "A reliable nanofabrication concept to engineer metallic nanometric gap structures and to incorporate silver nanoparticles within the gaps utilizing a combination of self-assembly strategies and electrochemical oxidation lithography is developed. The approach uses the differences in oxidation kinetics of n-octadecyltrichlorosilane (OTS) monolayer and bilayer structures. The processes are investigated in detail and form the basis for a new nanofabrication process.",

author = "T. Druzhinina and S. H{\"o}ppener and U.S. Schubert",

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AU - Höppener, S.

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AB - A reliable nanofabrication concept to engineer metallic nanometric gap structures and to incorporate silver nanoparticles within the gaps utilizing a combination of self-assembly strategies and electrochemical oxidation lithography is developed. The approach uses the differences in oxidation kinetics of n-octadecyltrichlorosilane (OTS) monolayer and bilayer structures. The processes are investigated in detail and form the basis for a new nanofabrication process.

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JO - Small : Nano Micro

JF - Small : Nano Micro

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New design concepts for the fabrication of nanometric gap structures: electrochemical oxidation of OTS mono- and bilayer structures

Abstract

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