Abstract
A reliable nanofabrication concept to engineer metallic nanometric gap structures and to incorporate silver nanoparticles within the gaps utilizing a combination of self-assembly strategies and electrochemical oxidation lithography is developed. The approach uses the differences in oxidation kinetics of n-octadecyltrichlorosilane (OTS) monolayer and bilayer structures. The processes are investigated in detail and form the basis for a new nanofabrication process.
Original language | English |
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Pages (from-to) | 852-857 |
Journal | Small : Nano Micro |
Volume | 8 |
Issue number | 6 |
DOIs | |
Publication status | Published - 2012 |