New design concepts for the fabrication of nanometric gap structures: electrochemical oxidation of OTS mono- and bilayer structures

T. Druzhinina, S. Höppener, U.S. Schubert

    Research output: Contribution to journalArticleAcademicpeer-review

    5 Citations (Scopus)

    Abstract

    A reliable nanofabrication concept to engineer metallic nanometric gap structures and to incorporate silver nanoparticles within the gaps utilizing a combination of self-assembly strategies and electrochemical oxidation lithography is developed. The approach uses the differences in oxidation kinetics of n-octadecyltrichlorosilane (OTS) monolayer and bilayer structures. The processes are investigated in detail and form the basis for a new nanofabrication process.
    Original languageEnglish
    Pages (from-to)852-857
    JournalSmall
    Volume8
    Issue number6
    DOIs
    Publication statusPublished - 2012

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