New design concepts for the fabrication of nanometric gap structures: electrochemical oxidation of OTS mono- and bilayer structures

T. Druzhinina; S. Höppener; U.S. Schubert

doi:10.1002/smll.201101842

New design concepts for the fabrication of nanometric gap structures: electrochemical oxidation of OTS mono- and bilayer structures

T. Druzhinina, S. Höppener, U.S. Schubert

Research output: Contribution to journal › Article › Academic › peer-review

5 Citations (Scopus)

Abstract

A reliable nanofabrication concept to engineer metallic nanometric gap structures and to incorporate silver nanoparticles within the gaps utilizing a combination of self-assembly strategies and electrochemical oxidation lithography is developed. The approach uses the differences in oxidation kinetics of n-octadecyltrichlorosilane (OTS) monolayer and bilayer structures. The processes are investigated in detail and form the basis for a new nanofabrication process.

Original language	English
Pages (from-to)	852-857
Journal	Small
Volume	8
Issue number	6
DOIs	https://doi.org/10.1002/smll.201101842
Publication status	Published - 2012

Access to Document

10.1002/smll.201101842

Cite this

@article{427c3e449e254243958ee36509ec578e,

title = "New design concepts for the fabrication of nanometric gap structures: electrochemical oxidation of OTS mono- and bilayer structures",

abstract = "A reliable nanofabrication concept to engineer metallic nanometric gap structures and to incorporate silver nanoparticles within the gaps utilizing a combination of self-assembly strategies and electrochemical oxidation lithography is developed. The approach uses the differences in oxidation kinetics of n-octadecyltrichlorosilane (OTS) monolayer and bilayer structures. The processes are investigated in detail and form the basis for a new nanofabrication process.",

author = "T. Druzhinina and S. H{\"o}ppener and U.S. Schubert",

year = "2012",

doi = "10.1002/smll.201101842",

language = "English",

volume = "8",

pages = "852--857",

journal = "Small",

issn = "1613-6810",

publisher = "Wiley-VCH Verlag",

number = "6",

}

TY - JOUR

T1 - New design concepts for the fabrication of nanometric gap structures: electrochemical oxidation of OTS mono- and bilayer structures

AU - Druzhinina, T.

AU - Höppener, S.

AU - Schubert, U.S.

PY - 2012

Y1 - 2012

N2 - A reliable nanofabrication concept to engineer metallic nanometric gap structures and to incorporate silver nanoparticles within the gaps utilizing a combination of self-assembly strategies and electrochemical oxidation lithography is developed. The approach uses the differences in oxidation kinetics of n-octadecyltrichlorosilane (OTS) monolayer and bilayer structures. The processes are investigated in detail and form the basis for a new nanofabrication process.

AB - A reliable nanofabrication concept to engineer metallic nanometric gap structures and to incorporate silver nanoparticles within the gaps utilizing a combination of self-assembly strategies and electrochemical oxidation lithography is developed. The approach uses the differences in oxidation kinetics of n-octadecyltrichlorosilane (OTS) monolayer and bilayer structures. The processes are investigated in detail and form the basis for a new nanofabrication process.

U2 - 10.1002/smll.201101842

DO - 10.1002/smll.201101842

M3 - Article

C2 - 22228708

VL - 8

SP - 852

EP - 857

JO - Small

JF - Small

SN - 1613-6810

IS - 6

ER -

New design concepts for the fabrication of nanometric gap structures: electrochemical oxidation of OTS mono- and bilayer structures

Abstract

Access to Document

Fingerprint

Cite this