Abstract
Nanosecond pulsed discharges in N2 and N2/H2O are studied with time-resolved optical emission spectroscopy, imaging and laser induced fluorescence of OH. The emission intensity shows that the emission is mainly caused by molecular nitrogen at the start of the discharge, and after the discharge mainly atomic nitrogen. The electron density is obtained by broadening of Ha, the gas temperature is obtained by OES and the distribution of OH radicals is studied by LIF. The chemistry involved in the production and destruction of OH is studied.
| Original language | English |
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| Publication status | Published - 2011 |
| Event | 23rd NNV Symposium on Plasma Physics and Radiation Technology, March 15-16, 2011, Lunteren, The Netherlands - De Werelt, Lunteren, Netherlands Duration: 15 Mar 2011 → 16 Mar 2011 https://www.tue.nl/fileadmin/content/faculteiten/tn/PMP/Research/Conferences___Workshops/23rD_NNV_symposium_on_Plasma_physics.pdf |
Conference
| Conference | 23rd NNV Symposium on Plasma Physics and Radiation Technology, March 15-16, 2011, Lunteren, The Netherlands |
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| Country/Territory | Netherlands |
| City | Lunteren |
| Period | 15/03/11 → 16/03/11 |
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