Nanopattering by direct-write atomic layer deposition

A.J.M. Mackus, S.A.F. Dielissen, J.J.L. Mulders, W.M.M. Kessels

Research output: Contribution to journalArticleAcademicpeer-review

53 Citations (Scopus)
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Abstract

A novel direct-write approach is presented, which relies on area-selective atomic layer deposition on seed layer patterns deposited by electron beam induced deposition. The method enables the nanopatterning of high-quality material with a lateral resolution of only 10 nm. Direct-write ALD is a viable alternative to lithography-based patterning with a better compatibility with sensitive nanomaterials.
Original languageEnglish
Pages (from-to)4477-4480
Number of pages4
JournalSpecial Publication - Royal Society of Chemistry
Volume4
Issue number15
DOIs
Publication statusPublished - 2012

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