Nanometer-scale silicon powders in RF silane plasmas

Ch. Hollenstein, G.M.W. Kroesen, J.-L. Dorier, C. Courteille, L. Sansonnens, W. Schwarzenbach, D. Magni, A.A. Howling

Research output: Chapter in Book/Report/Conference proceedingConference contributionAcademicpeer-review

Abstract

The different phases of the powder formation in RF (oxygen-)silane plasmas are discussed. Mass spectrometry revealed large negative ions, which are supposed to act as powder precursors. The particle number density and particle sizes as determined by multi-angle polarization sensitive light scattering during the agglomeraton phase can be described by a neutral agglomeration scheme. Finally JR absorption spectroscopy has been used to study the chemical composition of the nanometer particles and has been applied to in-situ oxidation of plasma produced silicon particles.
Original languageEnglish
Title of host publicationICRP-3/SPP-14 : 3rd International Conference on Reactive Plasmas and 14th Symposium on Plasma Processing : proceedings, January 21-24, 1997, Nara, Japan, vol. 4
EditorsK. Tachibana, Y. Watanabe
Place of PublicationS.n.
Publishers.n.
Pages227-228
Publication statusPublished - 1997

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