@inproceedings{3395a5471f454132ae48316d94b828d3,
title = "Nanometer level freeform surface measurements with the NANOMEFOS non-contact measurement machine",
abstract = "TNO, TU/e and NMi VSL have developed the NANOMEFOS measurement machine, This machine is capable of fast, universal and non-contact measurement of freeform optics up to 500 mm diameter, with an uncertainty of 30 nm. The optic is placed on a continuously rotating spindle, while a specially developed long range optical probe is positioned over it by a motion system. A separate metrology system measures probe and product position. Measurements of a tilted flat show a reproducibility of 2-4 nm rms. More complex artifacts are measured, and further calibrations are shown to demonstrate the nanometer level measurement uncertainty.",
author = "R. Henselmans and L.A. Cacace and G.F.IJ. Kramer and P.C.J.N. Rosielle and M. Steinbuch",
year = "2009",
doi = "10.1117/12.826067",
language = "English",
isbn = "9780819477163",
series = "Proceedings of SPIE",
publisher = "SPIE",
pages = "742606--1/11",
editor = "J.H. Burge and O.W. F{\"a}hnle and R. Williamson",
booktitle = "Optical Manufacturing and Testing VIII, 4–5 August 2009, San Diego, CA, USA",
address = "United States",
}