Nanometer level freeform surface measurements with the NANOMEFOS non-contact measurement machine

R. Henselmans, L.A. Cacace, G.F.IJ. Kramer, P.C.J.N. Rosielle, M. Steinbuch

Research output: Chapter in Book/Report/Conference proceedingConference contributionAcademicpeer-review

7 Citations (Scopus)
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Abstract

TNO, TU/e and NMi VSL have developed the NANOMEFOS measurement machine, This machine is capable of fast, universal and non-contact measurement of freeform optics up to 500 mm diameter, with an uncertainty of 30 nm. The optic is placed on a continuously rotating spindle, while a specially developed long range optical probe is positioned over it by a motion system. A separate metrology system measures probe and product position. Measurements of a tilted flat show a reproducibility of 2-4 nm rms. More complex artifacts are measured, and further calibrations are shown to demonstrate the nanometer level measurement uncertainty.
Original languageEnglish
Title of host publicationOptical Manufacturing and Testing VIII, 4–5 August 2009, San Diego, CA, USA
EditorsJ.H. Burge, O.W. Fähnle, R. Williamson
PublisherSPIE
Pages742606-1/11
ISBN (Print)9780819477163
DOIs
Publication statusPublished - 2009

Publication series

NameProceedings of SPIE
Volume7426
ISSN (Print)0277-786X

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  • Nanomefos

    P.C.J.N. (Nick) Rosielle (Manager)

    Mechanical Engineering

    Facility/equipment: Equipment

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