TNO, TU/e and NMi VSL have developed the NANOMEFOS measurement machine, This machine is capable of fast, universal and non-contact measurement of freeform optics up to 500 mm diameter, with an uncertainty of 30 nm. The optic is placed on a continuously rotating spindle, while a specially developed long range optical probe is positioned over it by a motion system. A separate metrology system measures probe and product position. Measurements of a tilted flat show a reproducibility of 2-4 nm rms. More complex artifacts are measured, and further calibrations are shown to demonstrate the nanometer level measurement uncertainty.
|Title of host publication||Optical Manufacturing and Testing VIII, 4–5 August 2009, San Diego, CA, USA|
|Editors||J.H. Burge, O.W. Fähnle, R. Williamson|
|Publication status||Published - 2009|
|Name||Proceedings of SPIE|