NANOMEFOS (Nanometer Accuracy Non-contact Measurement of Free-form Optical Surfaces)

R. Henselmans; P.C.J.N. Rosielle; J.P. Kappelhof

NANOMEFOS (Nanometer Accuracy Non-contact Measurement of Free-form Optical Surfaces)

R. Henselmans, P.C.J.N. Rosielle, J.P. Kappelhof

Control Systems Technology

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution › Academic › peer-review

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Abstract

This paper describes a conceptual measurement machine design, aiming for universal and noncontact form measurement of free-form optical surfaces up to Ø 500 mm with an uncertainty of 30 nm (k = 2). This conceptual design is the result of a M.Sc. graduation assignment done within Eindhoven University of Technology (TU/e) in collaboration with TNO TPD. Recently a PhD study has started at TU/e called NANOMEFOS (Nanometer Accuracy Non-contact Measurement of Free-form Optical Surfaces), to further develop this concept. In this paper, first the requirements and current metrology methods with respect to these requirements will be discussed. Next, the machine concept and the calculation of the error budget will be explained. Finally, a short overview of the current design will be given.

Original language	English
Title of host publication	ASPE Winter Topical Meeting on Free-form Optics: Design, Fabrication, Metrology and Assembly
Place of Publication	United States, Chapell Hill, North Carolina
Pages	97-101
Publication status	Published - 2004

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title = "NANOMEFOS (Nanometer Accuracy Non-contact Measurement of Free-form Optical Surfaces)",

abstract = "This paper describes a conceptual measurement machine design, aiming for universal and noncontact form measurement of free-form optical surfaces up to {\O} 500 mm with an uncertainty of 30 nm (k = 2). This conceptual design is the result of a M.Sc. graduation assignment done within Eindhoven University of Technology (TU/e) in collaboration with TNO TPD. Recently a PhD study has started at TU/e called NANOMEFOS (Nanometer Accuracy Non-contact Measurement of Free-form Optical Surfaces), to further develop this concept. In this paper, first the requirements and current metrology methods with respect to these requirements will be discussed. Next, the machine concept and the calculation of the error budget will be explained. Finally, a short overview of the current design will be given.",

author = "R. Henselmans and P.C.J.N. Rosielle and J.P. Kappelhof",

year = "2004",

language = "English",

pages = "97--101",

booktitle = "ASPE Winter Topical Meeting on Free-form Optics: Design, Fabrication, Metrology and Assembly",

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NANOMEFOS (Nanometer Accuracy Non-contact Measurement of Free-form Optical Surfaces). / Henselmans, R.; Rosielle, P.C.J.N.; Kappelhof, J.P.
ASPE Winter Topical Meeting on Free-form Optics: Design, Fabrication, Metrology and Assembly. United States, Chapell Hill, North Carolina, 2004. p. 97-101.

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution › Academic › peer-review

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T1 - NANOMEFOS (Nanometer Accuracy Non-contact Measurement of Free-form Optical Surfaces)

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AU - Rosielle, P.C.J.N.

AU - Kappelhof, J.P.

PY - 2004

Y1 - 2004

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M3 - Conference contribution

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EP - 101

BT - ASPE Winter Topical Meeting on Free-form Optics: Design, Fabrication, Metrology and Assembly

CY - United States, Chapell Hill, North Carolina

ER -

NANOMEFOS (Nanometer Accuracy Non-contact Measurement of Free-form Optical Surfaces)

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