Multilevel process on large area wafers for nanoscale devices

B.J. Pires, A.V. Silva, A. Moskaltsova, F.L. Deepak, P. Brogueira, D.C. Leitao, S. Cardoso

Research output: Contribution to journal › Article › Academic › peer-review

Original language	English
Pages (from-to)	222-229
Number of pages	8
Journal	Journal of Manufacturing Processes
Volume	32
DOIs	https://doi.org/10.1016/j.jmapro.2018.01.024
Publication status	Published - Apr 2018
Externally published	Yes

Keywords

@article{4fbf63b886be4170b60e6a91f42ca46f,

title = "Multilevel process on large area wafers for nanoscale devices",

keywords = "Nanofabrication, Electron beam lithography, Reactive ion etching, Metrology",

author = "B.J. Pires and A.V. Silva and A. Moskaltsova and F.L. Deepak and P. Brogueira and D.C. Leitao and S. Cardoso",

year = "2018",

month = apr,

doi = "10.1016/j.jmapro.2018.01.024",

language = "English",

volume = "32",

pages = "222--229",

journal = "Journal of Manufacturing Processes",

issn = "1526-6125",

publisher = "Elsevier",

}

TY - JOUR

T1 - Multilevel process on large area wafers for nanoscale devices

AU - Pires, B.J.

AU - Silva, A.V.

AU - Moskaltsova, A.

AU - Deepak, F.L.

AU - Brogueira, P.

AU - Leitao, D.C.

AU - Cardoso, S.

PY - 2018/4

Y1 - 2018/4

KW - Nanofabrication

KW - Electron beam lithography

KW - Reactive ion etching

KW - Metrology

U2 - 10.1016/j.jmapro.2018.01.024

DO - 10.1016/j.jmapro.2018.01.024

M3 - Article

SN - 1526-6125

VL - 32

SP - 222

EP - 229

JO - Journal of Manufacturing Processes

JF - Journal of Manufacturing Processes

ER -