Multi-mirror adaptive optics for control of thermally induced aberrations in extreme ultraviolet lithography

M. Habets, J. Scholten, S. Weiland, W. Coene

Research output: Chapter in Book/Report/Conference proceedingConference contributionAcademicpeer-review

Abstract

The imaging quality of the projection optics of an extreme ultraviolet lithography scanner degrades under the influence of thermally induced deformations of its mirrors. Wavefronts of different reticle points encounter different parts of the deformed mirrors, resulting in a field dependent wavefront error. This paper presents how ideas from multi-conjugate adaptive optics can be used to reduce these thermally induced aberrations. To this end a generic deformable mirror model is implemented. Linear actuator sensitivities are derived directly, based on nominal ray locations and directions, enabling fast prototyping. An integrated opto-thermo-mechanical mirror heating model is used to determine the evolution of thermally induced abberations over time. This transient simulation is used to analyze four different adaptive optics configurations and two different control algorithms. It is shown that by employing the multi-objective goal-attainment method, it is possible to improve the optical performance significantly when compared to minimizing the ℓ2-norm of the total residual wavefront error vector.

LanguageEnglish
Title of host publicationExtreme Ultraviolet (EUV) Lithography VII
EditorsE.M. Panning, K.A. Goldberg
PublisherSPIE
ISBN (Electronic)9781510600119
DOIs
StatePublished - 2016
EventExtreme Ultraviolet (EUV) Lithography VII, 22-25 Februari 2016, San Jose, US - San Jose, United States
Duration: 22 Feb 201625 Feb 2016
http://spie.org/conferences-and-exhibitions/advanced-lithography?mt.mc_id=ralcaw

Publication series

Nameproceedings of SPIE
Volume9776

Conference

ConferenceExtreme Ultraviolet (EUV) Lithography VII, 22-25 Februari 2016, San Jose, US
Abbreviated titleEUV2016
CountryUnited States
CitySan Jose
Period22/02/1625/02/16
Internet address

Fingerprint

Extreme ultraviolet lithography
Extreme Ultraviolet Lithography
Adaptive optics
Adaptive Optics
Wavefronts
Aberrations
Aberration
adaptive optics
Wave Front
aberration
Mirror
Mirrors
lithography
mirrors
Multi-conjugate Adaptive Optics
Linear actuators
Reticle
Deformable Mirror
deformable mirrors
Prototyping

Keywords

  • Aberration control
  • Adaptive optics
  • Deformable mirrors
  • EUV Lithography
  • Mirror heating
  • Thermally induced aberrations

Cite this

Habets, M., Scholten, J., Weiland, S., & Coene, W. (2016). Multi-mirror adaptive optics for control of thermally induced aberrations in extreme ultraviolet lithography. In E. M. Panning, & K. A. Goldberg (Eds.), Extreme Ultraviolet (EUV) Lithography VII [97762D] (proceedings of SPIE; Vol. 9776). SPIE. DOI: 10.1117/12.2219168
Habets, M. ; Scholten, J. ; Weiland, S. ; Coene, W./ Multi-mirror adaptive optics for control of thermally induced aberrations in extreme ultraviolet lithography. Extreme Ultraviolet (EUV) Lithography VII. editor / E.M. Panning ; K.A. Goldberg. SPIE, 2016. (proceedings of SPIE).
@inproceedings{6a4770170199482d939c6c6c08e04209,
title = "Multi-mirror adaptive optics for control of thermally induced aberrations in extreme ultraviolet lithography",
abstract = "The imaging quality of the projection optics of an extreme ultraviolet lithography scanner degrades under the influence of thermally induced deformations of its mirrors. Wavefronts of different reticle points encounter different parts of the deformed mirrors, resulting in a field dependent wavefront error. This paper presents how ideas from multi-conjugate adaptive optics can be used to reduce these thermally induced aberrations. To this end a generic deformable mirror model is implemented. Linear actuator sensitivities are derived directly, based on nominal ray locations and directions, enabling fast prototyping. An integrated opto-thermo-mechanical mirror heating model is used to determine the evolution of thermally induced abberations over time. This transient simulation is used to analyze four different adaptive optics configurations and two different control algorithms. It is shown that by employing the multi-objective goal-attainment method, it is possible to improve the optical performance significantly when compared to minimizing the ℓ2-norm of the total residual wavefront error vector.",
keywords = "Aberration control, Adaptive optics, Deformable mirrors, EUV Lithography, Mirror heating, Thermally induced aberrations",
author = "M. Habets and J. Scholten and S. Weiland and W. Coene",
year = "2016",
doi = "10.1117/12.2219168",
language = "English",
series = "proceedings of SPIE",
publisher = "SPIE",
editor = "E.M. Panning and K.A. Goldberg",
booktitle = "Extreme Ultraviolet (EUV) Lithography VII",
address = "United States",

}

Habets, M, Scholten, J, Weiland, S & Coene, W 2016, Multi-mirror adaptive optics for control of thermally induced aberrations in extreme ultraviolet lithography. in EM Panning & KA Goldberg (eds), Extreme Ultraviolet (EUV) Lithography VII., 97762D, proceedings of SPIE, vol. 9776, SPIE, Extreme Ultraviolet (EUV) Lithography VII, 22-25 Februari 2016, San Jose, US, San Jose, United States, 22/02/16. DOI: 10.1117/12.2219168

Multi-mirror adaptive optics for control of thermally induced aberrations in extreme ultraviolet lithography. / Habets, M.; Scholten, J.; Weiland, S.; Coene, W.

Extreme Ultraviolet (EUV) Lithography VII. ed. / E.M. Panning; K.A. Goldberg. SPIE, 2016. 97762D (proceedings of SPIE; Vol. 9776).

Research output: Chapter in Book/Report/Conference proceedingConference contributionAcademicpeer-review

TY - GEN

T1 - Multi-mirror adaptive optics for control of thermally induced aberrations in extreme ultraviolet lithography

AU - Habets,M.

AU - Scholten,J.

AU - Weiland,S.

AU - Coene,W.

PY - 2016

Y1 - 2016

N2 - The imaging quality of the projection optics of an extreme ultraviolet lithography scanner degrades under the influence of thermally induced deformations of its mirrors. Wavefronts of different reticle points encounter different parts of the deformed mirrors, resulting in a field dependent wavefront error. This paper presents how ideas from multi-conjugate adaptive optics can be used to reduce these thermally induced aberrations. To this end a generic deformable mirror model is implemented. Linear actuator sensitivities are derived directly, based on nominal ray locations and directions, enabling fast prototyping. An integrated opto-thermo-mechanical mirror heating model is used to determine the evolution of thermally induced abberations over time. This transient simulation is used to analyze four different adaptive optics configurations and two different control algorithms. It is shown that by employing the multi-objective goal-attainment method, it is possible to improve the optical performance significantly when compared to minimizing the ℓ2-norm of the total residual wavefront error vector.

AB - The imaging quality of the projection optics of an extreme ultraviolet lithography scanner degrades under the influence of thermally induced deformations of its mirrors. Wavefronts of different reticle points encounter different parts of the deformed mirrors, resulting in a field dependent wavefront error. This paper presents how ideas from multi-conjugate adaptive optics can be used to reduce these thermally induced aberrations. To this end a generic deformable mirror model is implemented. Linear actuator sensitivities are derived directly, based on nominal ray locations and directions, enabling fast prototyping. An integrated opto-thermo-mechanical mirror heating model is used to determine the evolution of thermally induced abberations over time. This transient simulation is used to analyze four different adaptive optics configurations and two different control algorithms. It is shown that by employing the multi-objective goal-attainment method, it is possible to improve the optical performance significantly when compared to minimizing the ℓ2-norm of the total residual wavefront error vector.

KW - Aberration control

KW - Adaptive optics

KW - Deformable mirrors

KW - EUV Lithography

KW - Mirror heating

KW - Thermally induced aberrations

U2 - 10.1117/12.2219168

DO - 10.1117/12.2219168

M3 - Conference contribution

T3 - proceedings of SPIE

BT - Extreme Ultraviolet (EUV) Lithography VII

PB - SPIE

ER -

Habets M, Scholten J, Weiland S, Coene W. Multi-mirror adaptive optics for control of thermally induced aberrations in extreme ultraviolet lithography. In Panning EM, Goldberg KA, editors, Extreme Ultraviolet (EUV) Lithography VII. SPIE. 2016. 97762D. (proceedings of SPIE). Available from, DOI: 10.1117/12.2219168