Multi-mirror adaptive optics for control of thermally induced aberrations in extreme ultraviolet lithography

M. Habets; J. Scholten; S. Weiland; W. Coene

doi:10.1117/12.2219168

Multi-mirror adaptive optics for control of thermally induced aberrations in extreme ultraviolet lithography

M. Habets, J. Scholten, S. Weiland, W. Coene

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution › Academic › peer-review

11 Citations (Scopus)

6 Downloads (Pure)

Abstract

The imaging quality of the projection optics of an extreme ultraviolet lithography scanner degrades under the influence of thermally induced deformations of its mirrors. Wavefronts of different reticle points encounter different parts of the deformed mirrors, resulting in a field dependent wavefront error. This paper presents how ideas from multi-conjugate adaptive optics can be used to reduce these thermally induced aberrations. To this end a generic deformable mirror model is implemented. Linear actuator sensitivities are derived directly, based on nominal ray locations and directions, enabling fast prototyping. An integrated opto-thermo-mechanical mirror heating model is used to determine the evolution of thermally induced abberations over time. This transient simulation is used to analyze four different adaptive optics configurations and two different control algorithms. It is shown that by employing the multi-objective goal-attainment method, it is possible to improve the optical performance significantly when compared to minimizing the ℓ₂-norm of the total residual wavefront error vector.

Original language	English
Title of host publication	Extreme Ultraviolet (EUV) Lithography VII
Editors	E.M. Panning, K.A. Goldberg
Publisher	SPIE
ISBN (Electronic)	9781510600119
DOIs	https://doi.org/10.1117/12.2219168
Publication status	Published - 2016
Event	Extreme Ultraviolet (EUV) Lithography VII, 22-25 Februari 2016, San Jose, US - San Jose, United States Duration: 22 Feb 2016 → 25 Feb 2016 http://spie.org/conferences-and-exhibitions/advanced-lithography?mt.mc_id=ralcaw

Publication series

Name	proceedings of SPIE
Volume	9776

Conference

Conference	Extreme Ultraviolet (EUV) Lithography VII, 22-25 Februari 2016, San Jose, US
Abbreviated title	EUV2016
Country/Territory	United States
City	San Jose
Period	22/02/16 → 25/02/16
Internet address	http://spie.org/conferences-and-exhibitions/advanced-lithography?mt.mc_id=ralcaw

Keywords

Aberration control
Adaptive optics
Deformable mirrors
EUV Lithography
Mirror heating
Thermally induced aberrations

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10.1117/12.2219168

Cite this

@inproceedings{6a4770170199482d939c6c6c08e04209,

title = "Multi-mirror adaptive optics for control of thermally induced aberrations in extreme ultraviolet lithography",

abstract = "The imaging quality of the projection optics of an extreme ultraviolet lithography scanner degrades under the influence of thermally induced deformations of its mirrors. Wavefronts of different reticle points encounter different parts of the deformed mirrors, resulting in a field dependent wavefront error. This paper presents how ideas from multi-conjugate adaptive optics can be used to reduce these thermally induced aberrations. To this end a generic deformable mirror model is implemented. Linear actuator sensitivities are derived directly, based on nominal ray locations and directions, enabling fast prototyping. An integrated opto-thermo-mechanical mirror heating model is used to determine the evolution of thermally induced abberations over time. This transient simulation is used to analyze four different adaptive optics configurations and two different control algorithms. It is shown that by employing the multi-objective goal-attainment method, it is possible to improve the optical performance significantly when compared to minimizing the ℓ2-norm of the total residual wavefront error vector.",

keywords = "Aberration control, Adaptive optics, Deformable mirrors, EUV Lithography, Mirror heating, Thermally induced aberrations",

author = "M. Habets and J. Scholten and S. Weiland and W. Coene",

year = "2016",

doi = "10.1117/12.2219168",

language = "English",

series = "proceedings of SPIE",

publisher = "SPIE",

editor = "E.M. Panning and K.A. Goldberg",

booktitle = "Extreme Ultraviolet (EUV) Lithography VII",

address = "United States",

note = "Extreme Ultraviolet (EUV) Lithography VII, 22-25 Februari 2016, San Jose, US, EUV2016 ; Conference date: 22-02-2016 Through 25-02-2016",

url = "http://spie.org/conferences-and-exhibitions/advanced-lithography?mt.mc_id=ralcaw",

}

Habets, M, Scholten, J, Weiland, S & Coene, W 2016, Multi-mirror adaptive optics for control of thermally induced aberrations in extreme ultraviolet lithography. in EM Panning & KA Goldberg (eds), Extreme Ultraviolet (EUV) Lithography VII., 97762D, proceedings of SPIE, vol. 9776, SPIE, Extreme Ultraviolet (EUV) Lithography VII, 22-25 Februari 2016, San Jose, US, San Jose, United States, 22/02/16. https://doi.org/10.1117/12.2219168

Multi-mirror adaptive optics for control of thermally induced aberrations in extreme ultraviolet lithography. / Habets, M.; Scholten, J.; Weiland, S. et al.
Extreme Ultraviolet (EUV) Lithography VII. ed. / E.M. Panning; K.A. Goldberg. SPIE, 2016. 97762D (proceedings of SPIE; Vol. 9776).

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution › Academic › peer-review

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AU - Habets, M.

AU - Scholten, J.

AU - Weiland, S.

AU - Coene, W.

PY - 2016

Y1 - 2016

N2 - The imaging quality of the projection optics of an extreme ultraviolet lithography scanner degrades under the influence of thermally induced deformations of its mirrors. Wavefronts of different reticle points encounter different parts of the deformed mirrors, resulting in a field dependent wavefront error. This paper presents how ideas from multi-conjugate adaptive optics can be used to reduce these thermally induced aberrations. To this end a generic deformable mirror model is implemented. Linear actuator sensitivities are derived directly, based on nominal ray locations and directions, enabling fast prototyping. An integrated opto-thermo-mechanical mirror heating model is used to determine the evolution of thermally induced abberations over time. This transient simulation is used to analyze four different adaptive optics configurations and two different control algorithms. It is shown that by employing the multi-objective goal-attainment method, it is possible to improve the optical performance significantly when compared to minimizing the ℓ2-norm of the total residual wavefront error vector.

AB - The imaging quality of the projection optics of an extreme ultraviolet lithography scanner degrades under the influence of thermally induced deformations of its mirrors. Wavefronts of different reticle points encounter different parts of the deformed mirrors, resulting in a field dependent wavefront error. This paper presents how ideas from multi-conjugate adaptive optics can be used to reduce these thermally induced aberrations. To this end a generic deformable mirror model is implemented. Linear actuator sensitivities are derived directly, based on nominal ray locations and directions, enabling fast prototyping. An integrated opto-thermo-mechanical mirror heating model is used to determine the evolution of thermally induced abberations over time. This transient simulation is used to analyze four different adaptive optics configurations and two different control algorithms. It is shown that by employing the multi-objective goal-attainment method, it is possible to improve the optical performance significantly when compared to minimizing the ℓ2-norm of the total residual wavefront error vector.

KW - Aberration control

KW - Adaptive optics

KW - Deformable mirrors

KW - EUV Lithography

KW - Mirror heating

KW - Thermally induced aberrations

U2 - 10.1117/12.2219168

DO - 10.1117/12.2219168

M3 - Conference contribution

AN - SCOPUS:84981313846

T3 - proceedings of SPIE

BT - Extreme Ultraviolet (EUV) Lithography VII

A2 - Panning, E.M.

A2 - Goldberg, K.A.

PB - SPIE

T2 - Extreme Ultraviolet (EUV) Lithography VII, 22-25 Februari 2016, San Jose, US

Y2 - 22 February 2016 through 25 February 2016

ER -

Multi-mirror adaptive optics for control of thermally induced aberrations in extreme ultraviolet lithography

Abstract

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Keywords

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