Multi-level nanoimprint lithography for large-area thin film transistor backplane manufacturing

Tamer Dogan, Joris de Riet, Thijs Bel, Roy Verbeek, Ilias Katsouras, Eric Meulenkamp, Gerwin Gelinck, Auke Jisk Kronemeijer (Corresponding author)

Research output: Contribution to journalArticleAcademicpeer-review

3 Citations (Scopus)


Thin film transistors (TFTs) are the basis for current AMOLED display arrays. For next-generation displays, higher resolution and cost-effective manufacturing of panels is adamant. The current benchmark patterning method in the display industry is photolithography. Here, we propose the use of a hybrid approach of nanoimprint lithography and conventional FPD processing for the realization of high-resolution display backplanes. We demonstrate the realization of sub-micron amorphous oxide semiconductor TFTs with multi-level nanoimprint lithography in order to decrease the number of patterning steps in display manufacturing. Top-gate self-aligned a-IGZO TFTs are realized with performance comparable to benchmark photolithography-based TFTs.

Original languageEnglish
Pages (from-to)241-244
Number of pages4
JournalJournal of Photopolymer Science and Technology
Issue number2
Publication statusPublished - 1 Jul 2020


  • Multi-level nanoimprint lithography


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