Multi-layered hydrogenated p-type microcrystalline silicon windows for a-Si: H thin film solar cells on opaque substrates

Y.J. Lee, S.H. Lee, R.E.I. Schropp, K.S. Lee, J.W. Lim, S.J. Yun

Research output: Contribution to journalArticleAcademicpeer-review

4 Citations (Scopus)

Abstract

The effects of multi-layered p-type microcrystalline (μc-) Si:H windows on the performance of substrate-type amorphous Si:H thin film solar cells on opaque substrates were investigated. The results were well explained in terms of H2-plasma-induced damage (HPID) at the p/i-interface and the near-interface region of the light-absorbing layer. The μc-Si:H was deposited using plasma enhanced chemical vapor deposition in a H2-rich atmosphere. A high microcrystalline volume fraction was obtained with a high H2 dilution ratio, which can cause considerable HPID. Cell efficiency was enhanced with a multi-layered p-type μc-Si:H composed of films with low and high crystalline volume fraction, compared to cells with single-layered μc-Si:H. In the multi-layered p-type μc-Si:H, the low crystalline film was placed on an i-Si:H layer to reduce HPID. The present work demonstrated that HPID was reduced at the p/i-interface and the near-interface region of the light-absorbing layer, and that the quality of the p-type μc-Si:H needs to be a significant consideration to achieve high efficiency.

Original languageEnglish
Pages (from-to)6240-6246
Number of pages7
JournalInternational Journal of Hydrogen Energy
Volume41
Issue number15
DOIs
Publication statusPublished - 27 Apr 2016

Keywords

  • a-Si
  • H-damage
  • Multi-layered p-Si
  • Nip-structure
  • Solar cell

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