Molecular processes in Ar-H2 expanding thermal plasma

R.P. Dahiya; H. Kishan; M.C.M. Sanden, van de; D.C. Schram

Molecular processes in Ar-H2 expanding thermal plasma

R.P. Dahiya, H. Kishan, M.C.M. Sanden, van de, D.C. Schram

Plasma & Materials Processing

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution › Academic › peer-review

Original language	English
Title of host publication	Proceedings of the 13th International Symposium on Plasma Chemistry II, Beijing, China, 18-22 augustus, 1997
Editors	C.K. Wu
Place of Publication	Beijing, China
Publisher	Peking University Press
Pages	541-545
ISBN (Print)	7-301-03483-0
Publication status	Published - 1997
Event	13th International Symposium on Plasma Chemistry (ISPC 13), August 18-22, 1997, Beijing, China - Beijing, China Duration: 18 Aug 1997 → 22 Aug 1997

Conference

Conference	13th International Symposium on Plasma Chemistry (ISPC 13), August 18-22, 1997, Beijing, China
Abbreviated title	ISPC 13
Country	China
City	Beijing
Period	18/08/97 → 22/08/97

Cite this

@inproceedings{834ea1fb94db4901a868d4c1ccbb5856,

title = "Molecular processes in Ar-H2 expanding thermal plasma",

author = "R.P. Dahiya and H. Kishan and {Sanden, van de}, M.C.M. and D.C. Schram",

year = "1997",

language = "English",

isbn = "7-301-03483-0",

pages = "541--545",

editor = "C.K. Wu",

booktitle = "Proceedings of the 13th International Symposium on Plasma Chemistry II, Beijing, China, 18-22 augustus, 1997",

publisher = "Peking University Press",

note = "13th International Symposium on Plasma Chemistry (ISPC 13), August 18-22, 1997, Beijing, China, ISPC 13 ; Conference date: 18-08-1997 Through 22-08-1997",

}

Dahiya, RP, Kishan, H, Sanden, van de, MCM & Schram, DC 1997, Molecular processes in Ar-H2 expanding thermal plasma. in CK Wu (ed.), Proceedings of the 13th International Symposium on Plasma Chemistry II, Beijing, China, 18-22 augustus, 1997. Peking University Press, Beijing, China, pp. 541-545, 13th International Symposium on Plasma Chemistry (ISPC 13), August 18-22, 1997, Beijing, China, Beijing, China, 18/08/97.

Molecular processes in Ar-H2 expanding thermal plasma. / Dahiya, R.P.; Kishan, H.; Sanden, van de, M.C.M.; Schram, D.C.

Proceedings of the 13th International Symposium on Plasma Chemistry II, Beijing, China, 18-22 augustus, 1997. ed. / C.K. Wu. Beijing, China : Peking University Press, 1997. p. 541-545.

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution › Academic › peer-review

TY - GEN

T1 - Molecular processes in Ar-H2 expanding thermal plasma

AU - Dahiya, R.P.

AU - Kishan, H.

AU - Sanden, van de, M.C.M.

AU - Schram, D.C.

PY - 1997

Y1 - 1997

M3 - Conference contribution

SN - 7-301-03483-0

SP - 541

EP - 545

BT - Proceedings of the 13th International Symposium on Plasma Chemistry II, Beijing, China, 18-22 augustus, 1997

A2 - Wu, C.K.

PB - Peking University Press

CY - Beijing, China

T2 - 13th International Symposium on Plasma Chemistry (ISPC 13), August 18-22, 1997, Beijing, China

Y2 - 18 August 1997 through 22 August 1997

ER -