Molecular processes in Ar-H2 expanding thermal plasma

R.P. Dahiya, H. Kishan, M.C.M. Sanden, van de, D.C. Schram

Research output: Chapter in Book/Report/Conference proceedingConference contributionAcademicpeer-review

Original languageEnglish
Title of host publicationProceedings of the 13th International Symposium on Plasma Chemistry II, Beijing, China, 18-22 augustus, 1997
EditorsC.K. Wu
Place of PublicationBeijing, China
PublisherPeking University Press
Pages541-545
ISBN (Print)7-301-03483-0
Publication statusPublished - 1997
Event13th International Symposium on Plasma Chemistry (ISPC 13), August 18-22, 1997, Beijing, China - Beijing, China
Duration: 18 Aug 199722 Aug 1997

Conference

Conference13th International Symposium on Plasma Chemistry (ISPC 13), August 18-22, 1997, Beijing, China
Abbreviated titleISPC 13
CountryChina
CityBeijing
Period18/08/9722/08/97

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