Modelling of RF plasmas in a parallel plate etch reactor

Research output: Thesis › Phd Thesis 1 (Research TU/e / Graduation TU/e)

1327 Downloads (Pure)

Original language	English
Qualification	Doctor of Philosophy
Awarding Institution	Applied Physics and Science Education
Supervisors/Advisors	de Hoog, F.J., Promotor Schram, Piet, Promotor
Award date	25 Mar 1988
Place of Publication	Eindhoven
Publisher	Technische Universiteit Eindhoven
DOIs	https://doi.org/10.6100/IR282627
Publication status	Published - 1988

Proefschrift.

Access to Document

@phdthesis{5cd4cae6ee734f2f8fb41bb390454135,

title = "Modelling of RF plasmas in a parallel plate etch reactor",

author = "P.M. Vallinga",

note = "Proefschrift.",

year = "1988",

doi = "10.6100/IR282627",

language = "English",

publisher = "Technische Universiteit Eindhoven",

type = "Phd Thesis 1 (Research TU/e / Graduation TU/e)",

school = "Applied Physics and Science Education",

}