Modelling of RF plasmas in a parallel plate etch reactor

P.M. Vallinga

Research output: ThesisPhd Thesis 1 (Research TU/e / Graduation TU/e)

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Original languageEnglish
QualificationDoctor of Philosophy
Awarding Institution
  • Applied Physics
Supervisors/Advisors
  • de Hoog, F.J., Promotor
  • Schram, Piet, Promotor
Award date25 Mar 1988
Place of PublicationEindhoven
Publisher
DOIs
Publication statusPublished - 1988

Bibliographical note

Proefschrift.

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