Modeling and prediction of thermally induced imaging errors in deep- and extreme-ultraviolet lithography

Research output: ThesisPhd Thesis 1 (Research TU/e / Graduation TU/e)Academic

LanguageEnglish
QualificationDoctor of Philosophy
Awarding Institution
  • Department of Electrical Engineering
Supervisors/Advisors
  • Coene, Wim, Promotor
  • Weiland, Siep, Promotor
Award date16 Dec 2013
Place of PublicationEindhoven
Publisher
Print ISBNs978-90-386-3515-6
DOIs
StatePublished - 2013

Bibliographical note

Proefschrift.

Cite this

@phdthesis{11abf3cdae7e4ae2a44ff9aeb30e4a43,
title = "Modeling and prediction of thermally induced imaging errors in deep- and extreme-ultraviolet lithography",
author = "C. Bikcora",
note = "Proefschrift.",
year = "2013",
doi = "10.6100/IR761509",
language = "English",
isbn = "978-90-386-3515-6",
publisher = "Technische Universiteit Eindhoven",
school = "Department of Electrical Engineering",

}

Bikcora, C 2013, 'Modeling and prediction of thermally induced imaging errors in deep- and extreme-ultraviolet lithography', Doctor of Philosophy, Department of Electrical Engineering, Eindhoven. DOI: 10.6100/IR761509

Modeling and prediction of thermally induced imaging errors in deep- and extreme-ultraviolet lithography. / Bikcora, C.

Eindhoven : Technische Universiteit Eindhoven, 2013. 143 p.

Research output: ThesisPhd Thesis 1 (Research TU/e / Graduation TU/e)Academic

TY - THES

T1 - Modeling and prediction of thermally induced imaging errors in deep- and extreme-ultraviolet lithography

AU - Bikcora,C.

N1 - Proefschrift.

PY - 2013

Y1 - 2013

U2 - 10.6100/IR761509

DO - 10.6100/IR761509

M3 - Phd Thesis 1 (Research TU/e / Graduation TU/e)

SN - 978-90-386-3515-6

PB - Technische Universiteit Eindhoven

CY - Eindhoven

ER -