Modeling and chemical vapor deposition in a fluidized bed reactor based on discrete particle simulation

G. Czok, M. Ye, M.A. van der Hoef, J.A.M. Kuipers, J. Werther

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Abstract

For better understanding the process of particle coating by chemical vapor deposition (CVD) in the fluidized bed, the simulation of the deposition process was combined with a discrete particle model (DPM). Based on the experimental results of the thermal decomposition of tri-isobutyl-aluminum (TIBA) to produce aluminum onto glass beads, mechanisms on the micro-scale were investigated by single particle tracking. Zones of excessive growth as well as zones of insufficient mixing were identified. In particular, the take-up of aluminum was traced for selected particles that exhibited a large mass of deposited aluminum what in turn provides insight into the homogeneity and quantity of the coating throughout the bed material.
Original languageEnglish
Article numberA57
Pages (from-to)A57-1/27
Number of pages27
JournalInternational Journal of Chemical Reactor Engineering
Volume3
Publication statusPublished - 2005

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