Model and Verification of a Plasma Etching Reactor with a Switched-Mode Power Converter

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Abstract

For reaching a high selectivity in plasma etching, it is required to precisely control the plasma ion energy. This can be realized by applying a tailored pulse-shape voltage waveform to the reactor table. Recent research has shown that switched-mode power converters can be used to generate this kind of waveform, with the benefit of increased efficiency compared to the traditional linear amplifier. However, the equivalent electric circuit model of the plasma etching reactor is required in order to do circuit simulation and make an optimized electronic design of such switched-mode power converters. Although several circuit models of the reactor have been presented in previous research, they can not be directly adopted in tailored pulse-shape biasing.

In this paper, a modified equivalent electric circuit model of the reactor is proposed. The plasma behaviour is modelled using the equivalent electric circuit and it is suitable for electric circuit simulation together with the power converter. Both the electrical waveforms and the normalized ion energy distribution can be obtained from the simulation, which are in line with the experimental results.
Original languageEnglish
Title of host publication12th International Conference on Electrical and Electromechanical Energy Conversion (ECCE Asia 2021)
PublisherInstitute of Electrical and Electronics Engineers
Pages568-573
Number of pages6
ISBN (Electronic)978-1-7281-6344-4
ISBN (Print)978-1-7281-6345-1
DOIs
Publication statusPublished - 13 Jul 2021
Event12th Annual Energy Conversion Congress and Exposition, ECCE-Asia 2021 - Virtual, Singapore, Singapore
Duration: 24 May 202127 May 2021
Conference number: 12
https://ecceasia2021.com/

Conference

Conference12th Annual Energy Conversion Congress and Exposition, ECCE-Asia 2021
Abbreviated titleECCE 2021
Country/TerritorySingapore
CitySingapore
Period24/05/2127/05/21
Internet address

Keywords

  • Equivalent electric circuit
  • ion energy disrtibution
  • plasma etching
  • switched-mode power converter
  • tailored pulse-shape biasing
  • equivalent electric circuit
  • ion energy distribution

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