Method of manufacturing nanowires and electronic device

E.P.A.M. Bakkers (Inventor), F. Roozeboom (Inventor), J.F.C.M. Verhoeven (Inventor), P. Sluis, van der (Inventor)

Research output: PatentPatent publication

Abstract

In the method, semiconductor substrates are etched to provide nanowires, said substrates comprising a first layer of a first material and a second layer of a second material with a mutual interface, which first and second materials are different. They may be different in the doping type. Alternatively, the main constituent of the material may be different, for example SiGe or SiC versus Si, or InP versus InAs. In the resulting nanowires, the interface is atomically sharp. The electronic devices having nanowires between a first and second electrode accordingly have very good electroluminescent and optoelectronic properties.
Original languageEnglish
Patent numberUS2005236357
Publication statusPublished - 27 Oct 2005

Fingerprint Dive into the research topics of 'Method of manufacturing nanowires and electronic device'. Together they form a unique fingerprint.

Cite this