Method of controlling a lithographic processing cell, device manufacturing method, lithographic apparatus, track unit, lithographic processing, cell and computer program

N.J.M. Nieuwelaar, van den (Inventor), J. Onvlee (Inventor), R. Boumen (Inventor)

Research output: PatentPatent publication

Abstract

A method of controlling a track apparatus in a lithocell apparatus arrangement, is presented herein. The lithocell includes a lithographic exposure apparatus configured to expose substrates and a track apparatus configured to prepare substrates before exposure and develop substrates after exposure. The method comprises predicting times at which the lithographic exposure apparatus will be available to accept a prepared substrate for exposure from the track apparatus, and adjusting a rate at which the track apparatus prepares substrates so that a substrate is prepared in time for acceptance by the lithographic exposure apparatus. By adjusting the track rate so that substrates are ready just as the lithographic exposure apparatus needs them, the use of the buffer in the track can be largely avoided or even eliminated entirely.
Original languageEnglish
Patent numberUS 7068351
Publication statusPublished - 2006

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manufacturing
computer programs
cells
adjusting
acceptability
buffers

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Nieuwelaar, van den, N.J.M. (Inventor) ; Onvlee, J. (Inventor) ; Boumen, R. (Inventor). / Method of controlling a lithographic processing cell, device manufacturing method, lithographic apparatus, track unit, lithographic processing, cell and computer program. Patent No.: US 7068351.
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title = "Method of controlling a lithographic processing cell, device manufacturing method, lithographic apparatus, track unit, lithographic processing, cell and computer program",
abstract = "A method of controlling a track apparatus in a lithocell apparatus arrangement, is presented herein. The lithocell includes a lithographic exposure apparatus configured to expose substrates and a track apparatus configured to prepare substrates before exposure and develop substrates after exposure. The method comprises predicting times at which the lithographic exposure apparatus will be available to accept a prepared substrate for exposure from the track apparatus, and adjusting a rate at which the track apparatus prepares substrates so that a substrate is prepared in time for acceptance by the lithographic exposure apparatus. By adjusting the track rate so that substrates are ready just as the lithographic exposure apparatus needs them, the use of the buffer in the track can be largely avoided or even eliminated entirely.",
author = "{Nieuwelaar, van den}, N.J.M. and J. Onvlee and R. Boumen",
year = "2006",
language = "English",
type = "Patent",
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Method of controlling a lithographic processing cell, device manufacturing method, lithographic apparatus, track unit, lithographic processing, cell and computer program. / Nieuwelaar, van den, N.J.M. (Inventor); Onvlee, J. (Inventor); Boumen, R. (Inventor).

Patent No.: US 7068351.

Research output: PatentPatent publication

TY - PAT

T1 - Method of controlling a lithographic processing cell, device manufacturing method, lithographic apparatus, track unit, lithographic processing, cell and computer program

AU - Nieuwelaar, van den, N.J.M.

AU - Onvlee, J.

AU - Boumen, R.

PY - 2006

Y1 - 2006

N2 - A method of controlling a track apparatus in a lithocell apparatus arrangement, is presented herein. The lithocell includes a lithographic exposure apparatus configured to expose substrates and a track apparatus configured to prepare substrates before exposure and develop substrates after exposure. The method comprises predicting times at which the lithographic exposure apparatus will be available to accept a prepared substrate for exposure from the track apparatus, and adjusting a rate at which the track apparatus prepares substrates so that a substrate is prepared in time for acceptance by the lithographic exposure apparatus. By adjusting the track rate so that substrates are ready just as the lithographic exposure apparatus needs them, the use of the buffer in the track can be largely avoided or even eliminated entirely.

AB - A method of controlling a track apparatus in a lithocell apparatus arrangement, is presented herein. The lithocell includes a lithographic exposure apparatus configured to expose substrates and a track apparatus configured to prepare substrates before exposure and develop substrates after exposure. The method comprises predicting times at which the lithographic exposure apparatus will be available to accept a prepared substrate for exposure from the track apparatus, and adjusting a rate at which the track apparatus prepares substrates so that a substrate is prepared in time for acceptance by the lithographic exposure apparatus. By adjusting the track rate so that substrates are ready just as the lithographic exposure apparatus needs them, the use of the buffer in the track can be largely avoided or even eliminated entirely.

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