Method for manufacturing a multi-layer stack structure with improved WVTR barrier property

Hinrik Vries, de (Inventor), M.C.M. Sanden, van de (Inventor)

Research output: PatentPatent publication

48 Downloads (Pure)

Abstract

A method and apparatus for manufacturing a multi-layer stack structure (12), the structure (12) comprising in order: a substrate (6a) a barrier layer (14) an adhesive layer (15) a barrier layer (14) a substrate (6b). The method comprises: a) providing two substrates (6a, 6b) in a single treatment space (5), the treatment space (5) comprising at least two electrodes (2, 3) for generating an atmospheric pressure glow discharge plasma in the treatment space(5); b) treating the facing surfaces of the two substrates (6a, 6b) simultaneously in the single treatment space (5); c) laminating the two treated substrates (6a, 6b) with an adhesive layer (15) in between the facing surfaces to obtain the multi-layer stack structure (12).
Original languageEnglish
Patent numberWO2009099325
Publication statusPublished - 13 Aug 2009

Fingerprint

Dive into the research topics of 'Method for manufacturing a multi-layer stack structure with improved WVTR barrier property'. Together they form a unique fingerprint.

Cite this