Method for forming microscopic structures on a substrate

A.F. Jong, de (Inventor), J.J.L. Mulders (Inventor), W.M.M. Kessels (Inventor), A.J.M. Mackus (Inventor)

Research output: PatentPatent publication

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Abstract

The invention relates to a method for forming microscopic structures. By scanning a focused particle beam over a substrate in the presence of a precursor fluid, a patterned seed layer is formed. By now growing this layer with Atomic Layer Deposition or Chemical Vapour Deposition, a high quality layer can be grown. An advantage of this method is that forming the seed layer takes relatively little time, as only a very thin layer needs to be deposited.
Original languageEnglish
Patent numberUS2010159370
Publication statusPublished - 24 Jun 2010

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