Abstract
Method and arrangement for controlling a discharge plasma in a discharge space having at least two spaced electrodes. A gas or gas mixt. is introduced in the discharge space, and a power supply for energizing the electrodes is provided for applying an a.c. plasma energizing voltage to the electrodes. At least one current pulse is generated and causes a plasma current and a displacement current. Means for controlling the plasma are provided and arranged to apply a displacement current rate of change for controlling local c.d. variations assocd. with a plasma variety having a low ratio of dynamic to static resistance, such as filamentary discharges. By damping such fast variations using a pulse forming circuit, a uniform glow discharge plasma was obtained.
| Original language | English |
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| Patent number | WO2007024134 |
| Publication status | Published - 1 Mar 2007 |