Method and apparatus for deposition using pulsed atomspheric pressure glow discharge

H.W. Vries, de; E. Aldea; S. Starostine; M. Creatore; M.C.M. Sanden, van de

Method and apparatus for deposition using pulsed atomspheric pressure glow discharge

H.W. Vries, de (Inventor), E. Aldea (Inventor), S. Starostine (Inventor), M. Creatore (Inventor), M.C.M. Sanden, van de (Inventor)

Research output: Patent › Patent publication

Abstract

Method and apparatus for deposition of a chemical compound or element using an atmospheric pressure glow discharge plasma in a treatment space (5) comprising two 5 electrodes (2, 3) connected to a power supply (4) for providing electrical power during an on-time (ton), the treatment space is filled with a gas composition of an active and an inert gas mixture, including a precursor of the chemical compound or element to be deposited.. Dust formation is prevented by using Nitrogen in the gas composition, applying short pulses and using a predetermined residence time of the gas composition 10 in the treatment space. Best results are obtained when using a stabilized plasma.

Original language	English
Patent number	WO2007139379
Publication status	Published - 6 Dec 2007

Cite this

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title = "Method and apparatus for deposition using pulsed atomspheric pressure glow discharge",

abstract = "Method and apparatus for deposition of a chemical compound or element using an atmospheric pressure glow discharge plasma in a treatment space (5) comprising two 5 electrodes (2, 3) connected to a power supply (4) for providing electrical power during an on-time (ton), the treatment space is filled with a gas composition of an active and an inert gas mixture, including a precursor of the chemical compound or element to be deposited.. Dust formation is prevented by using Nitrogen in the gas composition, applying short pulses and using a predetermined residence time of the gas composition 10 in the treatment space. Best results are obtained when using a stabilized plasma.",

author = "{Vries, de}, H.W. and E. Aldea and S. Starostine and M. Creatore and {Sanden, van de}, M.C.M.",

year = "2007",

month = dec,

day = "6",

language = "English",

type = "Patent",

note = "WO2007139379",

}

TY - PAT

T1 - Method and apparatus for deposition using pulsed atomspheric pressure glow discharge

AU - Vries, de, H.W.

AU - Aldea, E.

AU - Starostine, S.

AU - Creatore, M.

AU - Sanden, van de, M.C.M.

PY - 2007/12/6

Y1 - 2007/12/6

N2 - Method and apparatus for deposition of a chemical compound or element using an atmospheric pressure glow discharge plasma in a treatment space (5) comprising two 5 electrodes (2, 3) connected to a power supply (4) for providing electrical power during an on-time (ton), the treatment space is filled with a gas composition of an active and an inert gas mixture, including a precursor of the chemical compound or element to be deposited.. Dust formation is prevented by using Nitrogen in the gas composition, applying short pulses and using a predetermined residence time of the gas composition 10 in the treatment space. Best results are obtained when using a stabilized plasma.

AB - Method and apparatus for deposition of a chemical compound or element using an atmospheric pressure glow discharge plasma in a treatment space (5) comprising two 5 electrodes (2, 3) connected to a power supply (4) for providing electrical power during an on-time (ton), the treatment space is filled with a gas composition of an active and an inert gas mixture, including a precursor of the chemical compound or element to be deposited.. Dust formation is prevented by using Nitrogen in the gas composition, applying short pulses and using a predetermined residence time of the gas composition 10 in the treatment space. Best results are obtained when using a stabilized plasma.

UR - http://v3.espacenet.com/publicationDetails/biblio?DB=EPODOC&adjacent=true&locale=nl_nl&FT=D&date=20071206&CC=WO&NR=2007139379A1&KC=A1

M3 - Patent publication

M1 - WO2007139379

ER -

Method and apparatus for deposition using pulsed atomspheric pressure glow discharge

Abstract

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