Method and apparatus for deposition using pulsed atomspheric pressure glow discharge

H.W. Vries, de (Inventor), E. Aldea (Inventor), S. Starostine (Inventor), M. Creatore (Inventor), M.C.M. Sanden, van de (Inventor)

Research output: PatentPatent publication


Method and apparatus for deposition of a chemical compound or element using an atmospheric pressure glow discharge plasma in a treatment space (5) comprising two 5 electrodes (2, 3) connected to a power supply (4) for providing electrical power during an on-time (ton), the treatment space is filled with a gas composition of an active and an inert gas mixture, including a precursor of the chemical compound or element to be deposited.. Dust formation is prevented by using Nitrogen in the gas composition, applying short pulses and using a predetermined residence time of the gas composition 10 in the treatment space. Best results are obtained when using a stabilized plasma.
Original languageEnglish
Patent numberWO2007139379
Publication statusPublished - 6 Dec 2007


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