Method and apparatus for deposition of a chemical compound or element using an atmospheric pressure glow discharge plasma in a treatment space (5) comprising two 5 electrodes (2, 3) connected to a power supply (4) for providing electrical power during an on-time (ton), the treatment space is filled with a gas composition of an active and an inert gas mixture, including a precursor of the chemical compound or element to be deposited.. Dust formation is prevented by using Nitrogen in the gas composition, applying short pulses and using a predetermined residence time of the gas composition 10 in the treatment space. Best results are obtained when using a stabilized plasma.
|Publication status||Published - 6 Dec 2007|
Vries, de, H. W., Aldea, E., Starostine, S., Creatore, M., & Sanden, van de, M. C. M. (2007). Method and apparatus for deposition using pulsed atomspheric pressure glow discharge. (Patent No. WO2007139379).