Method and apparatus for depositing atomic layers on a substrate

A.J.P.M. Vermeer; Fred Roozeboom; Joop van Deelen

Method and apparatus for depositing atomic layers on a substrate

A.J.P.M. Vermeer (Inventor)
, Fred Roozeboom (Inventor)
, Joop van Deelen (Inventor)

Plasma & Materials Processing

Research output: Patent › Patent publication

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Abstract

Method of depositing an atomic layer on a substrate. The method comprises supplying a precursor gas from a precursor-gas supply of a deposition head that may be part of a rotatable drum. The precursor gas is provided from the precursor-gas supply towards the substrate. The method further comprises moving the precursor-gas supply by rotating the deposition head along the substrate which in its turn is moved along the rotating drum.

Original language	English
Patent number	US2018037994
IPC	H01L 21/ 677 A I
Priority date	12/10/17
Publication status	Published - 8 Feb 2018

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title = "Method and apparatus for depositing atomic layers on a substrate",

abstract = "Method of depositing an atomic layer on a substrate. The method comprises supplying a precursor gas from a precursor-gas supply of a deposition head that may be part of a rotatable drum. The precursor gas is provided from the precursor-gas supply towards the substrate. The method further comprises moving the precursor-gas supply by rotating the deposition head along the substrate which in its turn is moved along the rotating drum.",

author = "A.J.P.M. Vermeer and Fred Roozeboom and \{van Deelen\}, Joop",

year = "2018",

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day = "8",

language = "English",

type = "Patent",

note = "US2018037994; H01L 21/ 677 A I",

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T1 - Method and apparatus for depositing atomic layers on a substrate

AU - Vermeer, A.J.P.M.

AU - Roozeboom, Fred

AU - van Deelen, Joop

PY - 2018/2/8

Y1 - 2018/2/8

N2 - Method of depositing an atomic layer on a substrate. The method comprises supplying a precursor gas from a precursor-gas supply of a deposition head that may be part of a rotatable drum. The precursor gas is provided from the precursor-gas supply towards the substrate. The method further comprises moving the precursor-gas supply by rotating the deposition head along the substrate which in its turn is moved along the rotating drum.

AB - Method of depositing an atomic layer on a substrate. The method comprises supplying a precursor gas from a precursor-gas supply of a deposition head that may be part of a rotatable drum. The precursor gas is provided from the precursor-gas supply towards the substrate. The method further comprises moving the precursor-gas supply by rotating the deposition head along the substrate which in its turn is moved along the rotating drum.

M3 - Patent publication

M1 - US2018037994

ER -

Method and apparatus for depositing atomic layers on a substrate

Abstract

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