Method and apparatus for depositing atomic layers on a substrate

A.J.P.M. Vermeer (Inventor), Fred Roozeboom (Inventor), Joop van Deelen (Inventor)

Research output: PatentPatent publication

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Abstract

Method of depositing an atomic layer on a substrate. The method comprises supplying a precursor gas from a precursor-gas supply of a deposition head that may be part of a rotatable drum. The precursor gas is provided from the precursor-gas supply towards the substrate. The method further comprises moving the precursor-gas supply by rotating the deposition head along the substrate which in its turn is moved along the rotating drum.

Original languageEnglish
Patent numberUS2018037994
IPCH01L 21/ 677 A I
Priority date12/10/17
Publication statusPublished - 8 Feb 2018

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  • Cite this

    Vermeer, A. J. P. M., Roozeboom, F., & van Deelen, J. (2018). IPC No. H01L 21/ 677 A I. Method and apparatus for depositing atomic layers on a substrate. (Patent No. US2018037994).