Method and apparatus for depositing atomic layers on a substrate

A.J.P.M. Vermeer (Inventor), F. Roozeboom (Inventor), J. van Deelen (Inventor)

Research output: PatentPatent publication

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Method of depositing an atomic layer on a substrate. The method comprises supplying a precursor gas from a precursor-gas supply of a deposition head that may be part of a rotatable drum. The precursor gas is provided from the precursor-gas supply towards the substrate. The method further comprises moving the precursor-gas supply by rotating the deposition head along the substrate which in its turn is moved along the rotating drum.

Original languageEnglish
Patent numberUS9803280
IPCC23C 16/ 52 A I
Priority date21/03/16
Publication statusPublished - 31 Oct 2017


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