Method and apparatus for angular-resolved spectroscopic lithography characterization

A.J. Boef, den; A.J. Bleeker; Y.J.L.M. Dommelen, van; M. Dusa; A.G.M. Kiers; P.F. Lührmann; H.P.M. Pellemans; M. van der Schaar; C.D. Grouwstra; M.G.M.M. Kraaij, van

Method and apparatus for angular-resolved spectroscopic lithography characterization

A.J. Boef, den (Inventor)
, A.J. Bleeker (Inventor)
, Y.J.L.M. Dommelen, van (Inventor)
, M. Dusa (Inventor)
, A.G.M. Kiers (Inventor)
, P.F. Lührmann (Inventor)
, H.P.M. Pellemans (Inventor)
, M. van der Schaar (Inventor)
, C.D. Grouwstra (Inventor)
, M.G.M.M. Kraaij, van (Inventor)

Research output: Patent › Patent publication

Abstract

An apparatus and method to determine a property of a substrate by measuring, in the pupil plane of a high numerical aperture lens, an angle-resolved spectrum as a result of radiation being reflected off the substrate. The property may be angle and wavelength dependent and may include the intensity of TM- and TE-polarized light and their relative phase difference.

Original language	English
Patent number	EP1628164 (A2)
Publication status	Published - 22 Feb 2006

Cite this

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title = "Method and apparatus for angular-resolved spectroscopic lithography characterization",

abstract = "An apparatus and method to determine a property of a substrate by measuring, in the pupil plane of a high numerical aperture lens, an angle-resolved spectrum as a result of radiation being reflected off the substrate. The property may be angle and wavelength dependent and may include the intensity of TM- and TE-polarized light and their relative phase difference.",

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year = "2006",

month = feb,

day = "22",

language = "English",

type = "Patent",

note = "EP1628164 (A2)",

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TY - PAT

T1 - Method and apparatus for angular-resolved spectroscopic lithography characterization

AU - Boef, den, A.J.

AU - Bleeker, A.J.

AU - Dommelen, van, Y.J.L.M.

AU - Dusa, M.

AU - Kiers, A.G.M.

AU - Lührmann, P.F.

AU - Pellemans, H.P.M.

AU - van der Schaar, M.

AU - Grouwstra, C.D.

AU - Kraaij, van, M.G.M.M.

PY - 2006/2/22

Y1 - 2006/2/22

N2 - An apparatus and method to determine a property of a substrate by measuring, in the pupil plane of a high numerical aperture lens, an angle-resolved spectrum as a result of radiation being reflected off the substrate. The property may be angle and wavelength dependent and may include the intensity of TM- and TE-polarized light and their relative phase difference.

AB - An apparatus and method to determine a property of a substrate by measuring, in the pupil plane of a high numerical aperture lens, an angle-resolved spectrum as a result of radiation being reflected off the substrate. The property may be angle and wavelength dependent and may include the intensity of TM- and TE-polarized light and their relative phase difference.

UR - http://v3.espacenet.com/publicationDetails/biblio?CC=EP&NR=1628164A2&KC=A2&FT=D&date=20060222&DB=EPODOC&locale=en_EP

M3 - Patent publication

M1 - EP1628164 (A2)

ER -

Method and apparatus for angular-resolved spectroscopic lithography characterization

Abstract

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