Metal–organic covalent network chemical vapor deposition for gas separation

N.D. Boscher, M. Wang, A. Perrotta, K. Heinze, A. Creatore, K.K. Gleason

Research output: Contribution to journalArticleAcademicpeer-review

17 Citations (Scopus)

Abstract

The chemical vapor deposition (CVD) polymerization of metalloporphyrin building units is demonstrated to provide an easily up-scalable one-step method toward the deposition of a new class of dense and defect-free metal–organic covalent network (MOCN) layers. The resulting hyper-thin and flexible MOCN layers exhibit outstanding gas-separation performances for multiple gas pairs.
Original languageEnglish
Pages (from-to)7479-7485
Number of pages7
JournalAdvanced Materials
Volume28
Issue number34
DOIs
Publication statusPublished - 14 Sep 2016

Fingerprint

Network layers
Chemical vapor deposition
Gases
Metalloporphyrins
Polymerization
Defects

Keywords

  • free-radical polymerization
  • gas separation
  • iPECVD
  • metalloporphyrins
  • metal–organic covalent networks

Cite this

Boscher, N. D., Wang, M., Perrotta, A., Heinze, K., Creatore, A., & Gleason, K. K. (2016). Metal–organic covalent network chemical vapor deposition for gas separation. Advanced Materials, 28(34), 7479-7485. https://doi.org/10.1002/adma.201601010
Boscher, N.D. ; Wang, M. ; Perrotta, A. ; Heinze, K. ; Creatore, A. ; Gleason, K.K. / Metal–organic covalent network chemical vapor deposition for gas separation. In: Advanced Materials. 2016 ; Vol. 28, No. 34. pp. 7479-7485.
@article{fd2aea01d6494157a00cbf08d92e4a9e,
title = "Metal–organic covalent network chemical vapor deposition for gas separation",
abstract = "The chemical vapor deposition (CVD) polymerization of metalloporphyrin building units is demonstrated to provide an easily up-scalable one-step method toward the deposition of a new class of dense and defect-free metal–organic covalent network (MOCN) layers. The resulting hyper-thin and flexible MOCN layers exhibit outstanding gas-separation performances for multiple gas pairs.",
keywords = "free-radical polymerization, gas separation, iPECVD, metalloporphyrins, metal–organic covalent networks",
author = "N.D. Boscher and M. Wang and A. Perrotta and K. Heinze and A. Creatore and K.K. Gleason",
year = "2016",
month = "9",
day = "14",
doi = "10.1002/adma.201601010",
language = "English",
volume = "28",
pages = "7479--7485",
journal = "Advanced Materials",
issn = "0935-9648",
publisher = "Wiley-VCH Verlag",
number = "34",

}

Boscher, ND, Wang, M, Perrotta, A, Heinze, K, Creatore, A & Gleason, KK 2016, 'Metal–organic covalent network chemical vapor deposition for gas separation', Advanced Materials, vol. 28, no. 34, pp. 7479-7485. https://doi.org/10.1002/adma.201601010

Metal–organic covalent network chemical vapor deposition for gas separation. / Boscher, N.D.; Wang, M.; Perrotta, A.; Heinze, K.; Creatore, A.; Gleason, K.K.

In: Advanced Materials, Vol. 28, No. 34, 14.09.2016, p. 7479-7485.

Research output: Contribution to journalArticleAcademicpeer-review

TY - JOUR

T1 - Metal–organic covalent network chemical vapor deposition for gas separation

AU - Boscher, N.D.

AU - Wang, M.

AU - Perrotta, A.

AU - Heinze, K.

AU - Creatore, A.

AU - Gleason, K.K.

PY - 2016/9/14

Y1 - 2016/9/14

N2 - The chemical vapor deposition (CVD) polymerization of metalloporphyrin building units is demonstrated to provide an easily up-scalable one-step method toward the deposition of a new class of dense and defect-free metal–organic covalent network (MOCN) layers. The resulting hyper-thin and flexible MOCN layers exhibit outstanding gas-separation performances for multiple gas pairs.

AB - The chemical vapor deposition (CVD) polymerization of metalloporphyrin building units is demonstrated to provide an easily up-scalable one-step method toward the deposition of a new class of dense and defect-free metal–organic covalent network (MOCN) layers. The resulting hyper-thin and flexible MOCN layers exhibit outstanding gas-separation performances for multiple gas pairs.

KW - free-radical polymerization

KW - gas separation

KW - iPECVD

KW - metalloporphyrins

KW - metal–organic covalent networks

UR - http://www.scopus.com/inward/record.url?scp=84985994923&partnerID=8YFLogxK

U2 - 10.1002/adma.201601010

DO - 10.1002/adma.201601010

M3 - Article

C2 - 27296896

AN - SCOPUS:84985994923

VL - 28

SP - 7479

EP - 7485

JO - Advanced Materials

JF - Advanced Materials

SN - 0935-9648

IS - 34

ER -