Metal–organic covalent network chemical vapor deposition for gas separation

N.D. Boscher, M. Wang, A. Perrotta, K. Heinze, A. Creatore, K.K. Gleason

Research output: Contribution to journalArticleAcademicpeer-review

22 Citations (Scopus)

Abstract

The chemical vapor deposition (CVD) polymerization of metalloporphyrin building units is demonstrated to provide an easily up-scalable one-step method toward the deposition of a new class of dense and defect-free metal–organic covalent network (MOCN) layers. The resulting hyper-thin and flexible MOCN layers exhibit outstanding gas-separation performances for multiple gas pairs.
Original languageEnglish
Pages (from-to)7479-7485
Number of pages7
JournalAdvanced Materials
Volume28
Issue number34
DOIs
Publication statusPublished - 14 Sep 2016

Keywords

  • free-radical polymerization
  • gas separation
  • iPECVD
  • metalloporphyrins
  • metal–organic covalent networks

Fingerprint Dive into the research topics of 'Metal–organic covalent network chemical vapor deposition for gas separation'. Together they form a unique fingerprint.

Cite this