Metal–organic covalent network chemical vapor deposition for gas separation

N.D. Boscher, M. Wang, A. Perrotta, K. Heinze, A. Creatore, K.K. Gleason

Research output: Contribution to journalArticleAcademicpeer-review

34 Citations (Scopus)


The chemical vapor deposition (CVD) polymerization of metalloporphyrin building units is demonstrated to provide an easily up-scalable one-step method toward the deposition of a new class of dense and defect-free metal–organic covalent network (MOCN) layers. The resulting hyper-thin and flexible MOCN layers exhibit outstanding gas-separation performances for multiple gas pairs.
Original languageEnglish
Pages (from-to)7479-7485
Number of pages7
JournalAdvanced Materials
Issue number34
Publication statusPublished - 14 Sept 2016


  • free-radical polymerization
  • gas separation
  • iPECVD
  • metalloporphyrins
  • metal–organic covalent networks


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