Metal–organic covalent network chemical vapor deposition for gas separation

N.D. Boscher; M. Wang; A. Perrotta; K. Heinze; A. Creatore; K.K. Gleason

doi:10.1002/adma.201601010

Metal–organic covalent network chemical vapor deposition for gas separation

N.D. Boscher, M. Wang, A. Perrotta, K. Heinze, A. Creatore, K.K. Gleason

Research output: Contribution to journal › Article › Academic › peer-review

34 Citations (Scopus)

Abstract

The chemical vapor deposition (CVD) polymerization of metalloporphyrin building units is demonstrated to provide an easily up-scalable one-step method toward the deposition of a new class of dense and defect-free metal–organic covalent network (MOCN) layers. The resulting hyper-thin and flexible MOCN layers exhibit outstanding gas-separation performances for multiple gas pairs.

Original language	English
Pages (from-to)	7479-7485
Number of pages	7
Journal	Advanced Materials
Volume	28
Issue number	34
DOIs	https://doi.org/10.1002/adma.201601010
Publication status	Published - 14 Sept 2016

Keywords

free-radical polymerization
gas separation
iPECVD
metalloporphyrins
metal–organic covalent networks

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10.1002/adma.201601010

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keywords = "free-radical polymerization, gas separation, iPECVD, metalloporphyrins, metal–organic covalent networks",

author = "N.D. Boscher and M. Wang and A. Perrotta and K. Heinze and A. Creatore and K.K. Gleason",

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T1 - Metal–organic covalent network chemical vapor deposition for gas separation

AU - Boscher, N.D.

AU - Wang, M.

AU - Perrotta, A.

AU - Heinze, K.

AU - Creatore, A.

AU - Gleason, K.K.

PY - 2016/9/14

Y1 - 2016/9/14

N2 - The chemical vapor deposition (CVD) polymerization of metalloporphyrin building units is demonstrated to provide an easily up-scalable one-step method toward the deposition of a new class of dense and defect-free metal–organic covalent network (MOCN) layers. The resulting hyper-thin and flexible MOCN layers exhibit outstanding gas-separation performances for multiple gas pairs.

AB - The chemical vapor deposition (CVD) polymerization of metalloporphyrin building units is demonstrated to provide an easily up-scalable one-step method toward the deposition of a new class of dense and defect-free metal–organic covalent network (MOCN) layers. The resulting hyper-thin and flexible MOCN layers exhibit outstanding gas-separation performances for multiple gas pairs.

KW - free-radical polymerization

KW - gas separation

KW - iPECVD

KW - metalloporphyrins

KW - metal–organic covalent networks

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U2 - 10.1002/adma.201601010

DO - 10.1002/adma.201601010

M3 - Article

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VL - 28

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JO - Advanced Materials

JF - Advanced Materials

IS - 34

ER -

Metal–organic covalent network chemical vapor deposition for gas separation

Abstract

Keywords

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