Metallic tungsten nanostructures and high nanostructured thin films by deposition of tungsten oxide and subsequent reduction in a single hot-wire CVD process

P.P.R.M.L. Harks, Z.S. Houweling, H.M.M. Jong, de, Y. Kuang, J.W. Geus, R.E.I. Schropp

Research output: Contribution to journalArticleAcademicpeer-review

6 Citations (Scopus)
2 Downloads (Pure)

Abstract

The synthesis of metallic tungsten nanostructures and highly nanostructured thin films is presented. Crystalline tungsten oxide nanostructures are deposited on glassy carbon substrates kept at 700¿±¿100¿°C by oxidizing resistively heated tungsten filaments in an air flow under subatmospheric pressures. The internal morphology of the deposited tungsten oxide can be reproducibly controlled by the air pressure. After deposition, the tungsten oxides have been fully reduced to metallic tungsten by atomic hydrogen at a temperature of about 730¿°C. Polycrystalline metallic tungsten nanofibers, nanocrystallites, closed crystallite films, and nanogranular films are thus obtained in a single procedure involving deposition and subsequent reduction, at relatively low temperatures.
Original languageEnglish
Pages (from-to)70-75
JournalChemical Vapor Deposition
Volume18
Issue number1-3
DOIs
Publication statusPublished - Mar 2012

Fingerprint Dive into the research topics of 'Metallic tungsten nanostructures and high nanostructured thin films by deposition of tungsten oxide and subsequent reduction in a single hot-wire CVD process'. Together they form a unique fingerprint.

Cite this