Mechanism and kinetics of silylation of resist layers from the gas phase

R.J. Visser, J.P.W. Schellekens, M.E. Reuhman-Huisken, L.J. IJzendoorn, van

    Research output: Chapter in Book/Report/Conference proceedingConference contributionAcademicpeer-review

    43 Citations (Scopus)
    Original languageEnglish
    Title of host publicationProceedings of the 4th Conference on Advances in Resist Technology and Processing, 2-3 March 1987, Santa Clara, California
    EditorsM.J. Bowden
    Place of PublicationBellingham
    PublisherSPIE
    Pages111-117
    ISBN (Print)0-89252-806-0
    Publication statusPublished - 1987

    Publication series

    NameProceedings of SPIE
    Volume771
    ISSN (Print)0277-786X

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