@inproceedings{6c71c06a4e3f4dbc8924ee3a1ef3dcd9,
title = "Mechanism and kinetics of silylation of resist layers from the gas phase",
author = "R.J. Visser and J.P.W. Schellekens and M.E. Reuhman-Huisken and {IJzendoorn, van}, L.J.",
year = "1987",
language = "English",
isbn = "0-89252-806-0",
series = "Proceedings of SPIE",
publisher = "SPIE",
pages = "111--117",
editor = "M.J. Bowden",
booktitle = "Proceedings of the 4th Conference on Advances in Resist Technology and Processing, 2-3 March 1987, Santa Clara, California",
address = "United States",
}