Mechanical performance of new generation of ultrathin free-standing membrances

M. Borodachenkova

    Research output: ThesisPd Eng Thesis

    Abstract

    For new 13.5 nm wavelength lithography machines produced by ASML the protection of the reticle has vital importance. Particle contamination is one of the major concerns that have to be solved to continue the development of the new machines. A very promising solution for this problem comes in the form of a pellicle, an ultrathin membrane that shields the reticle from particle contamination. This report focuses on the qualification of the mechanical performance of new generation of pellicle in dependence on the preparation conditions.
    Original languageEnglish
    Supervisors/Advisors
    • Cottaar, E.J.E. (Ward), Supervisor
    • Janssen, Paul, External supervisor, External person
    Award date5 Dec 2018
    Place of PublicationEindhoven
    Publisher
    Publication statusPublished - 5 Dec 2018

    Bibliographical note

    PDEng thesis. - Confidential for ever.

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