For new 13.5 nm wavelength lithography machines produced by ASML the protection of the reticle has vital importance. Particle contamination is one of the major concerns that have to be solved to continue the development of the new machines. A very promising solution for this problem comes in the form of a pellicle, an ultrathin membrane that shields the reticle from particle contamination. This report focuses on the qualification of the mechanical performance of new generation of pellicle in dependence on the preparation conditions.
|Award date||5 Dec 2018|
|Place of Publication||Eindhoven|
|Publication status||Published - 5 Dec 2018|