Abstract
Densities of CF 2 radicals, rotational temperatures, and the degree of dissociation in radio-frequency fluorocarbon plasmas have been measured using Fourier transform infrared absorption spectroscopy and tunable diode laser infrared absorption spectroscopy. The CF2 densities obtained in CF4, CHF3fC2F6, and CF2C12 plasmas indicate that the partial pressure of CF2 is around l%-5% of the total pressure. From the spatial dependence of the CF2 density it was established that at high pressure, CF2 is produced either on the rf electrode or close to the rf electrode. Furthermore, a comparison between measured absorption spectra and a simulation of the rotational distributions has revealed that the rotational temperatures of CF4, CF2, and HF are all close to room temperature. FTIR spectra indicate that in plasmas of gases with a low F/C ratio (due to the presence of H or Cl) the source gas is converted for a significant part into other species.
| Original language | English |
|---|---|
| Pages (from-to) | 3102-3108 |
| Number of pages | 7 |
| Journal | Journal of Vacuum Science and Technology A: Vacuum, Surfaces, and Films |
| Volume | 12 |
| Issue number | 6 |
| DOIs | |
| Publication status | Published - 1 Jan 1994 |
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Measurements of radical densities in radio-frequency fluorocarbon plasmas using infrared absorption spectroscopy. / Haverlag, M.; Stoffels, E.; Stoffels, W.W.; Kroesen, G.M.W.; de Hoog, F.J.
In: Journal of Vacuum Science and Technology A: Vacuum, Surfaces, and Films, Vol. 12, No. 6, 01.01.1994, p. 3102-3108.Research output: Contribution to journal › Article › Academic › peer-review
TY - JOUR
T1 - Measurements of radical densities in radio-frequency fluorocarbon plasmas using infrared absorption spectroscopy
AU - Haverlag, M.
AU - Stoffels, E.
AU - Stoffels, W.W.
AU - Kroesen, G.M.W.
AU - de Hoog, F.J.
PY - 1994/1/1
Y1 - 1994/1/1
N2 - Densities of CF 2 radicals, rotational temperatures, and the degree of dissociation in radio-frequency fluorocarbon plasmas have been measured using Fourier transform infrared absorption spectroscopy and tunable diode laser infrared absorption spectroscopy. The CF2 densities obtained in CF4, CHF3fC2F6, and CF2C12 plasmas indicate that the partial pressure of CF2 is around l%-5% of the total pressure. From the spatial dependence of the CF2 density it was established that at high pressure, CF2 is produced either on the rf electrode or close to the rf electrode. Furthermore, a comparison between measured absorption spectra and a simulation of the rotational distributions has revealed that the rotational temperatures of CF4, CF2, and HF are all close to room temperature. FTIR spectra indicate that in plasmas of gases with a low F/C ratio (due to the presence of H or Cl) the source gas is converted for a significant part into other species.
AB - Densities of CF 2 radicals, rotational temperatures, and the degree of dissociation in radio-frequency fluorocarbon plasmas have been measured using Fourier transform infrared absorption spectroscopy and tunable diode laser infrared absorption spectroscopy. The CF2 densities obtained in CF4, CHF3fC2F6, and CF2C12 plasmas indicate that the partial pressure of CF2 is around l%-5% of the total pressure. From the spatial dependence of the CF2 density it was established that at high pressure, CF2 is produced either on the rf electrode or close to the rf electrode. Furthermore, a comparison between measured absorption spectra and a simulation of the rotational distributions has revealed that the rotational temperatures of CF4, CF2, and HF are all close to room temperature. FTIR spectra indicate that in plasmas of gases with a low F/C ratio (due to the presence of H or Cl) the source gas is converted for a significant part into other species.
UR - http://www.scopus.com/inward/record.url?scp=21844510712&partnerID=8YFLogxK
U2 - 10.1116/1.578943
DO - 10.1116/1.578943
M3 - Article
AN - SCOPUS:21844510712
VL - 12
SP - 3102
EP - 3108
JO - Journal of Vacuum Science and Technology A: Vacuum, Surfaces, and Films
JF - Journal of Vacuum Science and Technology A: Vacuum, Surfaces, and Films
SN - 0734-2101
IS - 6
ER -