TY - JOUR
T1 - Measurements and semi-empirical model describing the onset of powder formation as a function of process parameters in an rf silane-hydrogen discharge
AU - van den Donker, M.N.
AU - Hamers, E.A.G.
AU - Kroesen, G.M.W.
PY - 2005
Y1 - 2005
N2 - The transition pressure above which powder formation takes place was experimentally determined in a parallel plate RF silane-hydrogen plasma as a function of the process parameters-power, temperature, gas flow and hydrogen dilution-using the dc-bias voltage as powder formation indicator. The resulting empirical scaling law describes in what conditions powders are formed and in what conditions the plasma is powder-free. Second, a semi-empirical model was developed that treats the nano-particle density in the plasma. This model was applied to analytically describe the transition pressure above which nano-particle coagulation takes place as a function of process parameters. The resulting modelled scaling law shows good correspondence with the experimentally found scaling law. Finally, a series of amorphous silicon films was deposited. The reflection-transmission spectra of the films were measured and modelled through Tauc-Lorentz formalism. The optical analysis shows that at around the plasma transition pressure there occurs also a transition in the properties of the deposited material.
AB - The transition pressure above which powder formation takes place was experimentally determined in a parallel plate RF silane-hydrogen plasma as a function of the process parameters-power, temperature, gas flow and hydrogen dilution-using the dc-bias voltage as powder formation indicator. The resulting empirical scaling law describes in what conditions powders are formed and in what conditions the plasma is powder-free. Second, a semi-empirical model was developed that treats the nano-particle density in the plasma. This model was applied to analytically describe the transition pressure above which nano-particle coagulation takes place as a function of process parameters. The resulting modelled scaling law shows good correspondence with the experimentally found scaling law. Finally, a series of amorphous silicon films was deposited. The reflection-transmission spectra of the films were measured and modelled through Tauc-Lorentz formalism. The optical analysis shows that at around the plasma transition pressure there occurs also a transition in the properties of the deposited material.
U2 - 10.1088/0022-3727/38/14/013
DO - 10.1088/0022-3727/38/14/013
M3 - Article
SN - 0022-3727
VL - 38
SP - 2382
EP - 2389
JO - Journal of Physics D: Applied Physics
JF - Journal of Physics D: Applied Physics
IS - 14
ER -