Maskless patterning by pulsed-power plasma printing

T. Huiskamp, W.J.M. Brok, A.A.E. Stevens, E.J.M. Heesch, van, A.J.M. Pemen

Research output: Contribution to journalArticleAcademicpeer-review

13 Citations (Scopus)
3 Downloads (Pure)

Abstract

In this paper, pulsed-power technology was applied to plasma printing, which is a maskless plasma patterning solution that is being developed for the fabrication process of printed electronics. A high-voltage pulse source was developed and applied to a high-speed plasma printer to improve the speed of plasma printing. Experiments on plasma printing were used to compare the performance of the pulse source with the currently used alternating-current source. From plasma experiments, an electrical plasma model was derived for the plasma printer. Different parameters were investigated, such as the plasma energy as a function of gap distance, applied voltage, and the total amount of plasma that was generated. From these experiments, a connection was made between the plasma energy and the print effectiveness to arrive at optimal parameter values for fast plasma printing. It was concluded that higher plasma energy leads to higher print effectiveness, which leads to an increase in plasma print speed by a factor of 10 when using the pulse source. Moreover, scaling the PlasmaPint technology to reach higher print speeds is achievable by using more print heads or print heads with more tips.
Original languageEnglish
Pages (from-to)1913-1925
Number of pages13
JournalIEEE Transactions on Plasma Science
Volume40
Issue number7
DOIs
Publication statusPublished - 2012

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