Manufacturing pinhole arrays for X-ray source diagnostics using LIGA

M. Gerner, K. Holldack, R. Luttge, M. Schmidt

Research output: Contribution to journalArticleAcademicpeer-review

3 Citations (Scopus)

Abstract

The manufacturing of pinhole arrays with diameters 10 µm up to 60 µm in 100-300 µm gold foils is described using LIGA. These structures are used to characterize the electron beam in a storage ring by means of the emitted synchrotron radiation. The source inside the bending magnet 13 at BESSY I (single bunch mode, 70 mA ring current, pinholes: Ø 60 µm) is (448 ± 40) µm in height and (768 ± 40)µm in horizontal width. For BESSY II pinholes with Ø 10-20 µm will be used utilizing bending magnet radiation (resolution ~ 10 µm), single pinholes with 1-5 µm in diameter are dedicated to insertion device characterization (coherence).
Original languageEnglish
Pages (from-to)184-186
JournalMicrosystem Technologies
Volume4
Issue number4
DOIs
Publication statusPublished - 1998

Fingerprint

pinholes
Magnets
manufacturing
X rays
Storage rings
Synchrotron radiation
Gold
Metal foil
Electron beams
x rays
magnets
Radiation
ring currents
insertion
foils
synchrotron radiation
electron beams
gold
radiation

Cite this

Gerner, M. ; Holldack, K. ; Luttge, R. ; Schmidt, M. / Manufacturing pinhole arrays for X-ray source diagnostics using LIGA. In: Microsystem Technologies. 1998 ; Vol. 4, No. 4. pp. 184-186.
@article{e7cbecb9f6b848c8bc7f17580aeb8443,
title = "Manufacturing pinhole arrays for X-ray source diagnostics using LIGA",
abstract = "The manufacturing of pinhole arrays with diameters 10 µm up to 60 µm in 100-300 µm gold foils is described using LIGA. These structures are used to characterize the electron beam in a storage ring by means of the emitted synchrotron radiation. The source inside the bending magnet 13 at BESSY I (single bunch mode, 70 mA ring current, pinholes: {\O} 60 µm) is (448 ± 40) µm in height and (768 ± 40)µm in horizontal width. For BESSY II pinholes with {\O} 10-20 µm will be used utilizing bending magnet radiation (resolution ~ 10 µm), single pinholes with 1-5 µm in diameter are dedicated to insertion device characterization (coherence).",
author = "M. Gerner and K. Holldack and R. Luttge and M. Schmidt",
year = "1998",
doi = "10.1007/s005420050127",
language = "English",
volume = "4",
pages = "184--186",
journal = "Microsystem Technologies",
issn = "0946-7076",
publisher = "Springer",
number = "4",

}

Manufacturing pinhole arrays for X-ray source diagnostics using LIGA. / Gerner, M.; Holldack, K.; Luttge, R.; Schmidt, M.

In: Microsystem Technologies, Vol. 4, No. 4, 1998, p. 184-186.

Research output: Contribution to journalArticleAcademicpeer-review

TY - JOUR

T1 - Manufacturing pinhole arrays for X-ray source diagnostics using LIGA

AU - Gerner, M.

AU - Holldack, K.

AU - Luttge, R.

AU - Schmidt, M.

PY - 1998

Y1 - 1998

N2 - The manufacturing of pinhole arrays with diameters 10 µm up to 60 µm in 100-300 µm gold foils is described using LIGA. These structures are used to characterize the electron beam in a storage ring by means of the emitted synchrotron radiation. The source inside the bending magnet 13 at BESSY I (single bunch mode, 70 mA ring current, pinholes: Ø 60 µm) is (448 ± 40) µm in height and (768 ± 40)µm in horizontal width. For BESSY II pinholes with Ø 10-20 µm will be used utilizing bending magnet radiation (resolution ~ 10 µm), single pinholes with 1-5 µm in diameter are dedicated to insertion device characterization (coherence).

AB - The manufacturing of pinhole arrays with diameters 10 µm up to 60 µm in 100-300 µm gold foils is described using LIGA. These structures are used to characterize the electron beam in a storage ring by means of the emitted synchrotron radiation. The source inside the bending magnet 13 at BESSY I (single bunch mode, 70 mA ring current, pinholes: Ø 60 µm) is (448 ± 40) µm in height and (768 ± 40)µm in horizontal width. For BESSY II pinholes with Ø 10-20 µm will be used utilizing bending magnet radiation (resolution ~ 10 µm), single pinholes with 1-5 µm in diameter are dedicated to insertion device characterization (coherence).

U2 - 10.1007/s005420050127

DO - 10.1007/s005420050127

M3 - Article

VL - 4

SP - 184

EP - 186

JO - Microsystem Technologies

JF - Microsystem Technologies

SN - 0946-7076

IS - 4

ER -