Abstract
In this work a technology to fabricate low-voltage amorphous gallium-indium-zinc oxide thin film transistors (TFTs) based integrated circuits on 25 μm foils is presented. High performance TFTs were fabricated at low processing temperatures (<150 °C) with field effect mobility around 17 cm2 /V s. The technology is demonstrated with circuit building blocks relevant for radio frequency identification applications such as high-frequency functional code generators and efficient rectifiers. The integration level is about 300 transistors.
Original language | English |
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Article number | 162102 |
Number of pages | 3 |
Journal | Applied Physics Letters |
Volume | 98 |
Issue number | 16 |
DOIs | |
Publication status | Published - 18 Apr 2011 |
Externally published | Yes |