Low-temperature IGZO technology on transparent plastic foil by atmospheric spatial atomic layer deposition

Corné Frijters; Roy Verbeek; Gerard de Haas; Tung Huei Ke; Erwin Vandenplas; Marc Ameys; Jan Laurens van der Steen; Gerwin Gelinck; Eric Meulenkamp; Paul Poodt; Auke Kronemeijer; Ilias Katsouras

doi:10.36463/idw.2019.0489

Low-temperature IGZO technology on transparent plastic foil by atmospheric spatial atomic layer deposition

Corné Frijters
, Roy Verbeek
, Gerard de Haas
, Tung Huei Ke
, Erwin Vandenplas
, Marc Ameys
, Jan Laurens van der Steen
, Gerwin Gelinck
, Eric Meulenkamp
, Paul Poodt
, Auke Kronemeijer
, Ilias Katsouras

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution › Academic › peer-review

1 Citation (Scopus)

Abstract

We use sALD to deposit IGZO and Al2O3 layers in top-gated self-aligned TFTs, achieving a low-temperature process flow (d200^oC). We attain mobility of 8 cm²/Vs and switch-on voltage of -0.1 V for transistors with channel lengths down to 1 μm, enabling a 200 ppi QVGA display on transparent PEN foil.

Original language	English
Title of host publication	Proceedings of the International Display Workshops
Publisher	International Display Workshops
Pages	489-492
Number of pages	4
ISBN (Electronic)	9781713806301
DOIs	https://doi.org/10.36463/idw.2019.0489
Publication status	Published - 2019
Event	26th International Display Workshops (IDW 2019) - Sapporo, Japan Duration: 27 Nov 2019 → 29 Nov 2019 Conference number: 26

Publication series

Name	Proceedings of the International Display Workshops
Volume	26
ISSN (Print)	1883-2490

Conference

Conference	26th International Display Workshops (IDW 2019)
Abbreviated title	IDW 2019
Country/Territory	Japan
City	Sapporo
Period	27/11/19 → 29/11/19

Keywords

Display
IGZO
Large-area processing
Spatial atomic layer deposition
Thin-film transistors

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10.36463/idw.2019.0489

Cite this

Frijters, C., Verbeek, R., de Haas, G., Ke, T. H., Vandenplas, E., Ameys, M., van der Steen, J. L., Gelinck, G., Meulenkamp, E., Poodt, P., Kronemeijer, A., & Katsouras, I. (2019). Low-temperature IGZO technology on transparent plastic foil by atmospheric spatial atomic layer deposition. In Proceedings of the International Display Workshops (pp. 489-492). (Proceedings of the International Display Workshops; Vol. 26). International Display Workshops. https://doi.org/10.36463/idw.2019.0489

@inproceedings{fce10360ad98440eb3ac37f3e936d921,

title = "Low-temperature IGZO technology on transparent plastic foil by atmospheric spatial atomic layer deposition",

abstract = "We use sALD to deposit IGZO and Al2O3 layers in top-gated self-aligned TFTs, achieving a low-temperature process flow (d200oC). We attain mobility of 8 cm2/Vs and switch-on voltage of -0.1 V for transistors with channel lengths down to 1 μm, enabling a 200 ppi QVGA display on transparent PEN foil.",

keywords = "Display, IGZO, Large-area processing, Spatial atomic layer deposition, Thin-film transistors",

author = "Corn{\'e} Frijters and Roy Verbeek and \{de Haas\}, Gerard and Ke, \{Tung Huei\} and Erwin Vandenplas and Marc Ameys and \{van der Steen\}, \{Jan Laurens\} and Gerwin Gelinck and Eric Meulenkamp and Paul Poodt and Auke Kronemeijer and Ilias Katsouras",

note = "Publisher Copyright: {\textcopyright} 2019 ITE and SID.; 26th International Display Workshops (IDW 2019), IDW 2019 ; Conference date: 27-11-2019 Through 29-11-2019",

year = "2019",

doi = "10.36463/idw.2019.0489",

language = "English",

series = "Proceedings of the International Display Workshops",

publisher = "International Display Workshops",

pages = "489--492",

booktitle = "Proceedings of the International Display Workshops",

}

Frijters, C, Verbeek, R, de Haas, G, Ke, TH, Vandenplas, E, Ameys, M, van der Steen, JL, Gelinck, G, Meulenkamp, E, Poodt, P, Kronemeijer, A & Katsouras, I 2019, Low-temperature IGZO technology on transparent plastic foil by atmospheric spatial atomic layer deposition. in Proceedings of the International Display Workshops . Proceedings of the International Display Workshops, vol. 26, International Display Workshops, pp. 489-492, 26th International Display Workshops (IDW 2019), Sapporo, Japan, 27/11/19. https://doi.org/10.36463/idw.2019.0489

Low-temperature IGZO technology on transparent plastic foil by atmospheric spatial atomic layer deposition. / Frijters, Corné; Verbeek, Roy; de Haas, Gerard et al.
Proceedings of the International Display Workshops . International Display Workshops, 2019. p. 489-492 (Proceedings of the International Display Workshops; Vol. 26).

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution › Academic › peer-review

TY - GEN

T1 - Low-temperature IGZO technology on transparent plastic foil by atmospheric spatial atomic layer deposition

AU - Frijters, Corné

AU - Verbeek, Roy

AU - de Haas, Gerard

AU - Ke, Tung Huei

AU - Vandenplas, Erwin

AU - Ameys, Marc

AU - van der Steen, Jan Laurens

AU - Gelinck, Gerwin

AU - Meulenkamp, Eric

AU - Poodt, Paul

AU - Kronemeijer, Auke

AU - Katsouras, Ilias

N1 - Conference code: 26

PY - 2019

Y1 - 2019

N2 - We use sALD to deposit IGZO and Al2O3 layers in top-gated self-aligned TFTs, achieving a low-temperature process flow (d200oC). We attain mobility of 8 cm2/Vs and switch-on voltage of -0.1 V for transistors with channel lengths down to 1 μm, enabling a 200 ppi QVGA display on transparent PEN foil.

AB - We use sALD to deposit IGZO and Al2O3 layers in top-gated self-aligned TFTs, achieving a low-temperature process flow (d200oC). We attain mobility of 8 cm2/Vs and switch-on voltage of -0.1 V for transistors with channel lengths down to 1 μm, enabling a 200 ppi QVGA display on transparent PEN foil.

KW - Display

KW - IGZO

KW - Large-area processing

KW - Spatial atomic layer deposition

KW - Thin-film transistors

UR - https://www.scopus.com/pages/publications/85105272672

U2 - 10.36463/idw.2019.0489

DO - 10.36463/idw.2019.0489

M3 - Conference contribution

AN - SCOPUS:85105272672

T3 - Proceedings of the International Display Workshops

SP - 489

EP - 492

BT - Proceedings of the International Display Workshops

PB - International Display Workshops

T2 - 26th International Display Workshops (IDW 2019)

Y2 - 27 November 2019 through 29 November 2019

ER -

Low-temperature IGZO technology on transparent plastic foil by atmospheric spatial atomic layer deposition

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Keywords

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