Low-temperature aluminium oxide deposition using the extending thermal plasma technique : film properties and applications

I. Volintiru, J.L. Hemmen, van, M. Creatore, M.C.M. van de Sanden

Research output: Contribution to conferencePoster

Abstract

No abstract
Original languageEnglish
PagesB 22-
Publication statusPublished - 2006
Event18th NNV/CPS Symposium on Plasma Physics and Radiation Technology, March 22-23, 2006, Lunteren, The Netherlands - Lunteren, Netherlands
Duration: 22 Mar 200623 Mar 2006

Conference

Conference18th NNV/CPS Symposium on Plasma Physics and Radiation Technology, March 22-23, 2006, Lunteren, The Netherlands
CountryNetherlands
CityLunteren
Period22/03/0623/03/06

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Bibliographical note

18th symposium plasma physics and radiation technology : March 22-23, 2006, Lunteren : programme and abstracts

Cite this

Volintiru, I., Hemmen, van, J. L., Creatore, M., & van de Sanden , M. C. M. (2006). Low-temperature aluminium oxide deposition using the extending thermal plasma technique : film properties and applications. B 22-. Poster session presented at 18th NNV/CPS Symposium on Plasma Physics and Radiation Technology, March 22-23, 2006, Lunteren, The Netherlands, Lunteren, Netherlands.