Low-temperature aluminium oxide deposition using the extending thermal plasma technique : film properties and applications

I. Volintiru; J.L. Hemmen, van; M. Creatore; M.C.M. van de Sanden

Low-temperature aluminium oxide deposition using the extending thermal plasma technique : film properties and applications

I. Volintiru, J.L. Hemmen, van, M. Creatore, M.C.M. van de Sanden

Research output: Contribution to conference › Poster

Abstract

No abstract

Original language	English
Pages	B 22-
Publication status	Published - 2006
Event	18th NNV/CPS Symposium on Plasma Physics and Radiation Technology, March 22-23, 2006, Lunteren, The Netherlands - Lunteren, Netherlands Duration: 22 Mar 2006 → 23 Mar 2006

Conference

Conference	18th NNV/CPS Symposium on Plasma Physics and Radiation Technology, March 22-23, 2006, Lunteren, The Netherlands
Country/Territory	Netherlands
City	Lunteren
Period	22/03/06 → 23/03/06

Bibliographical note

18th symposium plasma physics and radiation technology : March 22-23, 2006, Lunteren : programme and abstracts

Cite this

Volintiru, I., Hemmen, van, J. L., Creatore, M., & van de Sanden , M. C. M. (2006). Low-temperature aluminium oxide deposition using the extending thermal plasma technique : film properties and applications. B 22-. Poster session presented at 18th NNV/CPS Symposium on Plasma Physics and Radiation Technology, March 22-23, 2006, Lunteren, The Netherlands, Lunteren, Netherlands.

@conference{2694705374e842729eaac10a1042794d,

title = "Low-temperature aluminium oxide deposition using the extending thermal plasma technique : film properties and applications",

abstract = "No abstract",

author = "I. Volintiru and {Hemmen, van}, J.L. and M. Creatore and {van de Sanden}, M.C.M.",

note = "18th symposium plasma physics and radiation technology : March 22-23, 2006, Lunteren : programme and abstracts; 18th NNV/CPS Symposium on Plasma Physics and Radiation Technology, March 22-23, 2006, Lunteren, The Netherlands ; Conference date: 22-03-2006 Through 23-03-2006",

year = "2006",

language = "English",

pages = "B 22--",

}

Low-temperature aluminium oxide deposition using the extending thermal plasma technique : film properties and applications. / Volintiru, I.; Hemmen, van, J.L.; Creatore, M. et al.

2006. B 22- Poster session presented at 18th NNV/CPS Symposium on Plasma Physics and Radiation Technology, March 22-23, 2006, Lunteren, The Netherlands, Lunteren, Netherlands.

Research output: Contribution to conference › Poster

TY - CONF

T1 - Low-temperature aluminium oxide deposition using the extending thermal plasma technique : film properties and applications

AU - Volintiru, I.

AU - Hemmen, van, J.L.

AU - Creatore, M.

AU - van de Sanden , M.C.M.

N1 - 18th symposium plasma physics and radiation technology : March 22-23, 2006, Lunteren : programme and abstracts

PY - 2006

Y1 - 2006

N2 - No abstract

AB - No abstract

M3 - Poster

SP - B 22-

T2 - 18th NNV/CPS Symposium on Plasma Physics and Radiation Technology, March 22-23, 2006, Lunteren, The Netherlands

Y2 - 22 March 2006 through 23 March 2006

ER -

Low-temperature aluminium oxide deposition using the extending thermal plasma technique : film properties and applications

Abstract

Conference

Bibliographical note

Fingerprint

Cite this