Low-pressure chemical vapour deposition of LiCoO2 thin films: a systematic investigation of the deposition parameters

J.F.M. Oudenhoven, T. Dongen, van, R.A.H. Niessen, M.H.J.M. Croon, de, P.H.L. Notten

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Abstract

The feasibility of volatile precursor low-pressure chemical vapor deposition (LPCVD) for the production of LiCoO2 cathodes for all solid-state microbatteries was examined. To test this feasibility, and gain insight into the deposition behavior, the influence of the deposition parameters on the properties of LPCVD grown thin-film LiCoO2 cathodes was systematically investigated. The deposition temperature, concentration of the various reactants, and duration of thin-film growth were varied. The resulting LiCoO2 layers were subjected to X-ray diffraction, inductively coupled plasma-atomic emission spectrometry, Rutherford backscattering spectroscopy, and electrochemical analyses. Stoichiometry of the films could be controlled by varying the precursor flows. Samples deposited at high temperatures with the optimum stoichiometry showed a high crystallinity and a high electrochemical activity; a storage capacity corresponding to a reversible Li-content around the theoretical value of 0.55 per Co was reached, and a good cycling stability was obtained when using this electrode in combination with a solid-state electrolyte. © 2009 The Electrochemical Society.
Original languageEnglish
Pages (from-to)D169-D174
JournalJournal of the Electrochemical Society
Volume156
Issue number5
DOIs
Publication statusPublished - 2009

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