Low-pressure chemical vapor deposition as a tool for deposition of thin film battery materials

J.F.M. Oudenhoven, T. Dongen, van, R.A.H. Niessen, M.H.J.M. Croon, de, P.H.L. Notten

Research output: Chapter in Book/Report/Conference proceedingConference contributionAcademicpeer-review

2 Citations (Scopus)
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Abstract

Low Pressure Chemical Vapor Deposition was utilized for the deposition of LiCoO2 cathode materials for all-solid-state thin-film micro-batteries. To obtain insight in the deposition process, the most important process parameters were optimized for the deposition of crystalline electrode films on planar substrates. Also the electrochemical activity of the obtained LiCoO2 films was demonstrated. © The Electrochemical Society.
Original languageEnglish
Title of host publication17th International Chemical Vapor Deposition Symposium (CVD-XVII) as part of the 216th Meeting of the Electrochemical Society 4 -9 October 2009, Vienna
Place of PublicationPennington, NJ
PublisherElectrochemical Society, Inc.
Pages653-658
ISBN (Print)978-156677745-2
DOIs
Publication statusPublished - 2009

Publication series

NameECS Transactions
Volume25
ISSN (Print)1938-6737

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