Abstract
Application of the ion scattering spectroscopy techniques to studying materials for microelectronics are considered in detail. The main attention is paid to the low-energy ion scattering, and a comparison is given between this technique and the other methods used for studying solid surfaces. The possibilities to obtain quantitative analytical and structural information from the results of low-energy ion scattering measurements on the surface of various materials are analyzed.
| Original language | English |
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| Pages (from-to) | 789-805 |
| Number of pages | 17 |
| Journal | Physics, Chemistry and Mechanics of Surfaces |
| Volume | 8 |
| Issue number | 6 |
| Publication status | Published - 1993 |