| Original language | English |
|---|---|
| Title of host publication | Proc. 13th International Conference on Chemical Capor Deposition, CVD-XIII, 189th Meeting of the Electrochemical Society |
| Editors | T.M. Besmann, et. al. |
| Pages | 516-522 |
| Publication status | Published - 1996 |
| Event | conference; Proc. 13th International Conference on Chemical Capor Deposition, CVD-XIII, 189th Meeting of the Electrochemical Society, Los Angeles, CA, May 1996 - Duration: 1 Jan 1996 → … |
Conference
| Conference | conference; Proc. 13th International Conference on Chemical Capor Deposition, CVD-XIII, 189th Meeting of the Electrochemical Society, Los Angeles, CA, May 1996 |
|---|---|
| Period | 1/01/96 → … |
| Other | Proc. 13th International Conference on Chemical Capor Deposition, CVD-XIII, 189th Meeting of the Electrochemical Society, Los Angeles, CA, May 1996 |
Cite this
Karouta, F., Hassel, van, J. G., Kalfane, A., Es, van, C. M., & Eijkemans, T. J. (1996). Low damage deposition of silicon nitride on InP substrates. In T. M. Besmann, & E. al. (Eds.), Proc. 13th International Conference on Chemical Capor Deposition, CVD-XIII, 189th Meeting of the Electrochemical Society (pp. 516-522)
@inproceedings{ea5b58e9e72843d287f91f6e02879ca7,
title = "Low damage deposition of silicon nitride on InP substrates",
author = "F. Karouta and {Hassel, van}, J.G. and A. Kalfane and {Es, van}, C.M. and T.J. Eijkemans",
year = "1996",
language = "English",
isbn = "1-56677-155-2",
pages = "516--522",
editor = "T.M. Besmann and et. al.",
booktitle = "Proc. 13th International Conference on Chemical Capor Deposition, CVD-XIII, 189th Meeting of the Electrochemical Society",
}
Karouta, F, Hassel, van, JG, Kalfane, A, Es, van, CM & Eijkemans, TJ 1996, Low damage deposition of silicon nitride on InP substrates. in TM Besmann & E al. (eds), Proc. 13th International Conference on Chemical Capor Deposition, CVD-XIII, 189th Meeting of the Electrochemical Society. pp. 516-522, conference; Proc. 13th International Conference on Chemical Capor Deposition, CVD-XIII, 189th Meeting of the Electrochemical Society, Los Angeles, CA, May 1996, 1/01/96.
Low damage deposition of silicon nitride on InP substrates. / Karouta, F.; Hassel, van, J.G.; Kalfane, A.; Es, van, C.M.; Eijkemans, T.J.
Proc. 13th International Conference on Chemical Capor Deposition, CVD-XIII, 189th Meeting of the Electrochemical Society. ed. / T.M. Besmann; et. al. 1996. p. 516-522.Research output: Chapter in Book/Report/Conference proceeding › Conference contribution › Academic › peer-review
TY - GEN
T1 - Low damage deposition of silicon nitride on InP substrates
AU - Karouta, F.
AU - Hassel, van, J.G.
AU - Kalfane, A.
AU - Es, van, C.M.
AU - Eijkemans, T.J.
PY - 1996
Y1 - 1996
M3 - Conference contribution
SN - 1-56677-155-2
SP - 516
EP - 522
BT - Proc. 13th International Conference on Chemical Capor Deposition, CVD-XIII, 189th Meeting of the Electrochemical Society
A2 - Besmann, T.M.
A2 - al., et.
ER -
Karouta F, Hassel, van JG, Kalfane A, Es, van CM, Eijkemans TJ. Low damage deposition of silicon nitride on InP substrates. In Besmann TM, al. E, editors, Proc. 13th International Conference on Chemical Capor Deposition, CVD-XIII, 189th Meeting of the Electrochemical Society. 1996. p. 516-522