Low damage deposition of silicon nitride on InP substrates

F. Karouta, J.G. Hassel, van, A. Kalfane, C.M. Es, van, T.J. Eijkemans

Research output: Chapter in Book/Report/Conference proceedingConference contributionAcademicpeer-review

Original languageEnglish
Title of host publicationProc. 13th International Conference on Chemical Capor Deposition, CVD-XIII, 189th Meeting of the Electrochemical Society
EditorsT.M. Besmann, et. al.
Pages516-522
Publication statusPublished - 1996
Eventconference; Proc. 13th International Conference on Chemical Capor Deposition, CVD-XIII, 189th Meeting of the Electrochemical Society, Los Angeles, CA, May 1996 -
Duration: 1 Jan 1996 → …

Conference

Conferenceconference; Proc. 13th International Conference on Chemical Capor Deposition, CVD-XIII, 189th Meeting of the Electrochemical Society, Los Angeles, CA, May 1996
Period1/01/96 → …
OtherProc. 13th International Conference on Chemical Capor Deposition, CVD-XIII, 189th Meeting of the Electrochemical Society, Los Angeles, CA, May 1996

Cite this

Karouta, F., Hassel, van, J. G., Kalfane, A., Es, van, C. M., & Eijkemans, T. J. (1996). Low damage deposition of silicon nitride on InP substrates. In T. M. Besmann, & E. al. (Eds.), Proc. 13th International Conference on Chemical Capor Deposition, CVD-XIII, 189th Meeting of the Electrochemical Society (pp. 516-522)