Lithographic apparatus stage coupling

Jens de Goeij; Ron de Bruijn; J.P.M.B. Vermeulen; R.W.A.H. Leenaars; Bas Jansen

Lithographic apparatus stage coupling

Jens de Goeij (Inventor)
, Ron de Bruijn (Inventor)
, J.P.M.B. Vermeulen (Inventor)
, R.W.A.H. Leenaars (Inventor)
, Bas Jansen (Inventor)

Research output: Patent › Patent publication

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Abstract

A coupling having a variable stiffness is disclosed. The coupling comprises: a deformable component and a support being movably arranged with respect to each other, wherein the deformable component comprises a viscoelastic material and wherein the support has a recess configured to receive the deformable component, wherein the deformable component is configured to deform in volumetric deformation when, in use, a force is applied to the deformable component, and wherein a shape of the deformable component and a shape of the support are configured such that the variable stiffness gradually increases as a function of an amount of the force. A stage apparatus may comprise the coupling.

Original language	English
Patent number	WO2023078788
Priority date	11/05/23
Publication status	Published - 11 May 2023

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WO2023078788A1Final published version, 1.48 MB

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title = "Lithographic apparatus stage coupling",

abstract = "A coupling having a variable stiffness is disclosed. The coupling comprises: a deformable component and a support being movably arranged with respect to each other, wherein the deformable component comprises a viscoelastic material and wherein the support has a recess configured to receive the deformable component, wherein the deformable component is configured to deform in volumetric deformation when, in use, a force is applied to the deformable component, and wherein a shape of the deformable component and a shape of the support are configured such that the variable stiffness gradually increases as a function of an amount of the force. A stage apparatus may comprise the coupling.",

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year = "2023",

month = may,

day = "11",

language = "English",

type = "Patent",

note = "WO2023078788",

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TY - PAT

T1 - Lithographic apparatus stage coupling

AU - de Goeij, Jens

AU - de Bruijn, Ron

AU - Vermeulen, J.P.M.B.

AU - Leenaars, R.W.A.H.

AU - Jansen, Bas

PY - 2023/5/11

Y1 - 2023/5/11

N2 - A coupling having a variable stiffness is disclosed. The coupling comprises: a deformable component and a support being movably arranged with respect to each other, wherein the deformable component comprises a viscoelastic material and wherein the support has a recess configured to receive the deformable component, wherein the deformable component is configured to deform in volumetric deformation when, in use, a force is applied to the deformable component, and wherein a shape of the deformable component and a shape of the support are configured such that the variable stiffness gradually increases as a function of an amount of the force. A stage apparatus may comprise the coupling.

AB - A coupling having a variable stiffness is disclosed. The coupling comprises: a deformable component and a support being movably arranged with respect to each other, wherein the deformable component comprises a viscoelastic material and wherein the support has a recess configured to receive the deformable component, wherein the deformable component is configured to deform in volumetric deformation when, in use, a force is applied to the deformable component, and wherein a shape of the deformable component and a shape of the support are configured such that the variable stiffness gradually increases as a function of an amount of the force. A stage apparatus may comprise the coupling.

M3 - Patent publication

M1 - WO2023078788

ER -

Lithographic apparatus stage coupling

Abstract

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