Lithographic apparatus and device manufacturing method

M.C.J. Baggen; C.M. Biggelaar, van den; T. Tso; M.F. Heertjes; R. Kamidi; D.A.P.H. Houben; C.P.M.J. Baggen; M.J.G. Molengraft, van de

Lithographic apparatus and device manufacturing method

M.C.J. Baggen (Inventor), C.M. Biggelaar, van den (Inventor), T. Tso (Inventor), M.F. Heertjes (Inventor), R. Kamidi (Inventor), D.A.P.H. Houben (Inventor), C.P.M.J. Baggen (Inventor), M.J.G. Molengraft, van de (Inventor)

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Abstract

In a lithographic apparatus, a feedforward transfer function of a control system, is determined by: a) iteratively learning a feedforward output signal of the control system by iterative learning control for a given setpoint signal; b) determining a relation between the learned feedforward output signal and the setpoint signal; and c) applying the relation as the feedforward transfer function of the control system. A learned feedforward, which has been learned for one or more specific setpoint signals only, can be adapted to provide a setpoint signal dependent feedforward output signal. The learned feedforward can be made more robust against setpoint variations.

Original language	English
Patent number	US 8,014,881 B2
Publication status	Published - 7 Sept 2011

Cite this

@misc{78d6b23f12c74bc98b3a025216f0bfad,

title = "Lithographic apparatus and device manufacturing method",

abstract = "In a lithographic apparatus, a feedforward transfer function of a control system, is determined by: a) iteratively learning a feedforward output signal of the control system by iterative learning control for a given setpoint signal; b) determining a relation between the learned feedforward output signal and the setpoint signal; and c) applying the relation as the feedforward transfer function of the control system. A learned feedforward, which has been learned for one or more specific setpoint signals only, can be adapted to provide a setpoint signal dependent feedforward output signal. The learned feedforward can be made more robust against setpoint variations.",

author = "M.C.J. Baggen and {Biggelaar, van den}, C.M. and T. Tso and M.F. Heertjes and R. Kamidi and D.A.P.H. Houben and C.P.M.J. Baggen and {Molengraft, van de}, M.J.G.",

year = "2011",

month = sep,

day = "7",

language = "English",

type = "Patent",

note = "US 8,014,881 B2",

}

TY - PAT

T1 - Lithographic apparatus and device manufacturing method

AU - Baggen, M.C.J.

AU - Biggelaar, van den, C.M.

AU - Tso, T.

AU - Heertjes, M.F.

AU - Kamidi, R.

AU - Houben, D.A.P.H.

AU - Baggen, C.P.M.J.

AU - Molengraft, van de, M.J.G.

PY - 2011/9/7

Y1 - 2011/9/7

N2 - In a lithographic apparatus, a feedforward transfer function of a control system, is determined by: a) iteratively learning a feedforward output signal of the control system by iterative learning control for a given setpoint signal; b) determining a relation between the learned feedforward output signal and the setpoint signal; and c) applying the relation as the feedforward transfer function of the control system. A learned feedforward, which has been learned for one or more specific setpoint signals only, can be adapted to provide a setpoint signal dependent feedforward output signal. The learned feedforward can be made more robust against setpoint variations.

AB - In a lithographic apparatus, a feedforward transfer function of a control system, is determined by: a) iteratively learning a feedforward output signal of the control system by iterative learning control for a given setpoint signal; b) determining a relation between the learned feedforward output signal and the setpoint signal; and c) applying the relation as the feedforward transfer function of the control system. A learned feedforward, which has been learned for one or more specific setpoint signals only, can be adapted to provide a setpoint signal dependent feedforward output signal. The learned feedforward can be made more robust against setpoint variations.

M3 - Patent publication

M1 - US 8,014,881 B2

ER -

Lithographic apparatus and device manufacturing method

Abstract

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