Lithographic apparatus and device manufacturing method

M.W. Herpen, van (Inventor), V.Y. Banine (Inventor), J.P.H. Kuster, de (Inventor), R. Moors (Inventor), L.H.J. Stevens (Inventor), B.T. Wolschrijn (Inventor), Y. Sidelnikov (Inventor), M.H. Velden, van der (Inventor), W.A. Soer (Inventor), T. Stein (Inventor), K. Gielissen (Inventor)

Research output: PatentPatent publication

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Abstract

A lithographic apparatus configured to project a patterned beam of radiation onto a target portion of a substrate is disclosed. The apparatus includes a first radiation dose detector and a second radiation dose detector, each detector comprising a secondary electron emission surface configured to receive a radiation flux and to emit secondary electrons due to the receipt of the radiation flux, the first radiation dose detector located upstream with respect to the second radiation dose detector viewed with respect to a direction of radiation transmission, and a meter, connected to each detector, to detect a current or voltage resulting from the secondary electron emission from the respective electron emission surface.
Original languageEnglish
Patent numberUS2009173360
Publication statusPublished - 9 Jul 2009

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