Lithographic apparatus and device manufacturing method

P.R. Bartray (Inventor), W.J. Box (Inventor), C.C.M. Luijten (Inventor), M.A.J. Luttikhuis (Inventor), M. Bhomer, ten (Inventor), F. Migchelbrink (Inventor), J.J. Kuit (Inventor)

Research output: PatentPatent publication

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Abstract

A lithographic apparatus is provided that includes an illumination system for conditioning a beam of radiation, and a support for supporting a patterning device. The patterning device serves to impart the beam of radiation with a pattern in its cross-section. The apparatus also includes a substrate table for holding a substrate, a projection system for projecting the patterned beam onto a target portion of the substrate, an isolated reference frame for providing a reference surface, and a measuring system for measuring the substrate with respect to the reference surface. The reference frame includes a material having a coefficient of thermal expansion of greater than about 2.9x10/K.
Original languageEnglish
Patent numberUS2005151954
Publication statusPublished - 14 Jul 2005

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