Lithographic apparatus and device manufacturing method

P.R. Bartray; W.J. Box; C.C.M. Luijten; M.A.J. Luttikhuis; M. Bhomer, ten; F. Migchelbrink; J.J. Kuit

Lithographic apparatus and device manufacturing method

P.R. Bartray (Inventor), W.J. Box (Inventor), C.C.M. Luijten (Inventor), M.A.J. Luttikhuis (Inventor), M. Bhomer, ten (Inventor), F. Migchelbrink (Inventor), J.J. Kuit (Inventor)

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Abstract

A lithographic apparatus is provided that includes an illumination system for conditioning a beam of radiation, and a support for supporting a patterning device. The patterning device serves to impart the beam of radiation with a pattern in its cross-section. The apparatus also includes a substrate table for holding a substrate, a projection system for projecting the patterned beam onto a target portion of the substrate, an isolated reference frame for providing a reference surface, and a measuring system for measuring the substrate with respect to the reference surface. The reference frame includes a material having a coefficient of thermal expansion of greater than about 2.9x10/K.

Original language	English
Patent number	US2005151954
Publication status	Published - 14 Jul 2005

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title = "Lithographic apparatus and device manufacturing method",

abstract = "A lithographic apparatus is provided that includes an illumination system for conditioning a beam of radiation, and a support for supporting a patterning device. The patterning device serves to impart the beam of radiation with a pattern in its cross-section. The apparatus also includes a substrate table for holding a substrate, a projection system for projecting the patterned beam onto a target portion of the substrate, an isolated reference frame for providing a reference surface, and a measuring system for measuring the substrate with respect to the reference surface. The reference frame includes a material having a coefficient of thermal expansion of greater than about 2.9x10/K.",

author = "P.R. Bartray and W.J. Box and C.C.M. Luijten and M.A.J. Luttikhuis and {Bhomer, ten}, M. and F. Migchelbrink and J.J. Kuit",

year = "2005",

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day = "14",

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type = "Patent",

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AU - Bartray, P.R.

AU - Box, W.J.

AU - Luijten, C.C.M.

AU - Luttikhuis, M.A.J.

AU - Bhomer, ten, M.

AU - Migchelbrink, F.

AU - Kuit, J.J.

PY - 2005/7/14

Y1 - 2005/7/14

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AB - A lithographic apparatus is provided that includes an illumination system for conditioning a beam of radiation, and a support for supporting a patterning device. The patterning device serves to impart the beam of radiation with a pattern in its cross-section. The apparatus also includes a substrate table for holding a substrate, a projection system for projecting the patterned beam onto a target portion of the substrate, an isolated reference frame for providing a reference surface, and a measuring system for measuring the substrate with respect to the reference surface. The reference frame includes a material having a coefficient of thermal expansion of greater than about 2.9x10/K.

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