Latest advances in plasma techniques used for atomic layer deposition

Research output: Non-textual formWeb publication/siteProfessional

Abstract

Webinar: Nanotechweb.org, Institute of Physics (IOP), November 2012 Atomic layer deposition (ALD) has established itself as the deposition technique of choice for ultra-thin, controlled, conformal, pin-hole free coatings. In an age of nanotechnology advances ALD is an ideal tool for depositing on nanoscale features. Professor Erwin Kessels covers: recent advances in plasma ALD processing through careful control of the ion energies and plasma conditions to tune the properties of the materials being deposited. applications of ALD that have benefited from advanced plasma techniques. The webinar runs for 45 minutes and includes a question and answer session at the end.
Original languageEnglish
PublisherInstitute of Physics
Publication statusPublished - 2012

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atomic layer epitaxy
nanotechnology
coatings
physics
ions
energy

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title = "Latest advances in plasma techniques used for atomic layer deposition",
abstract = "Webinar: Nanotechweb.org, Institute of Physics (IOP), November 2012 Atomic layer deposition (ALD) has established itself as the deposition technique of choice for ultra-thin, controlled, conformal, pin-hole free coatings. In an age of nanotechnology advances ALD is an ideal tool for depositing on nanoscale features. Professor Erwin Kessels covers: recent advances in plasma ALD processing through careful control of the ion energies and plasma conditions to tune the properties of the materials being deposited. applications of ALD that have benefited from advanced plasma techniques. The webinar runs for 45 minutes and includes a question and answer session at the end.",
author = "W.M.M. Kessels",
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Latest advances in plasma techniques used for atomic layer deposition. Kessels, W.M.M. (Author). 2012. Institute of Physics.

Research output: Non-textual formWeb publication/siteProfessional

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