Laser-to-droplet alignment sensitivity relevant for laser-produced plasma sources of extreme ultraviolet light

Sten A. Reijers; Dmitry Kurilovich; Francesco Torretti; Hanneke Gelderblom; Oscar O. Versolato

doi:10.1063/1.5026950

Laser-to-droplet alignment sensitivity relevant for laser-produced plasma sources of extreme ultraviolet light

Sten A. Reijers, Dmitry Kurilovich, Francesco Torretti, Hanneke Gelderblom, Oscar O. Versolato

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Abstract

We present and experimentally validate a model describing the sensitivity of the tilt angle, expansion, and the propulsion velocity of a tin micro-droplet irradiated by a 1 μm Nd:YAG laser pulse to its relative alignment. This sensitivity is particularly relevant in industrial plasma sources of extreme ultraviolet light for nanolithographic applications. Our model has but a single parameter: the dimensionless ratio of the laser spot size to the effective size of the droplet, which is related to the position of the plasma critical density surface. Our model enables the development of straightforward scaling arguments, in turn enabling precise control of the alignment sensitivity.

Original language	English
Article number	013102
Number of pages	7
Journal	Journal of Applied Physics
Volume	124
Issue number	1
DOIs	https://doi.org/10.1063/1.5026950
Publication status	Published - 7 Jul 2018

Funding

We thank Alexander Klein for fruitful discussions. This work is part of an Industrial Partnership Programme of the Netherlands Organization for Scientific Research (NWO). This research programme was co-financed by ASML. Part of this work was carried out at the Advanced Research Center for Nanolithography (ARCNL), a public-private partnership between the University of Amsterdam (UvA), the Vrije Universiteit Amsterdam (VU), NWO and ASML.

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Laser-to-droplet alignment sensitivity relevant for laser-produced plasma sources of extreme ultraviolet light

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